Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content

Abstract

In this work, selected properties of metallic and oxide thin films based on titanium and cobalt were described. Thin-film coatings were prepared using the magnetron sputtering method. The deposition was carried out from sintered targets with different Co-content (2 at.%, 12 at.% and 50 at.%). The relation between the Ti–Co target composition and the Co-content in the metallic and oxide films was examined. There was 15–20% more cobalt in the films than in the target. Moreover, the deposition rate under neutral conditions (in Ar plasma) was even 10-times higher compared to oxidizing Ar:O2 (70:30) plasma. A comprehensive analysis of the structural properties (performed with GIXRD and SEM) revealed the amorphous nature of (Ti,Co)Ox coatings, regardless of the cobalt content in the coating. The fine-grained, homogenous microstructure was observed, where cracks and voids were identified only for films with high Co-content. Optical studies have shown that these films were well transparent (60% ÷ 80%), and the amount of cobalt in the target from which they were sputtered had a significant impact on the decrease in the transparency level, the slight shift of the absorption edge position (from 279 nm to 289 nm) as well as the decrease in their optical band gap energy (from 3.13 eV to 1.71 eV). Electrical studies have shown that in (Ti,Co)Ox thin films, a unipolar memristive-like effect can be observed. The occurrence of such effects has not been reported so far in the case of TiO2 coatings with the addition of Co.

Development of a Transparent Thermal Reflective Thin Film Coating for Accurate Separation of Food-Grade Plastics in Recycling Process via AI-Based Thermal Image Processing

“…Generally, depositing under low pressure has certain advantages, such as increasing the mean free path, decreasing gas scattering, increased energy transfer, and decreased gas density variation. Gas density variation can lead to uneven deposition and hinder uniformity [26,27]. Considering that our objective was to achieve maximum infrared reflection, smoother and more even surface coatings were desired, hence why the pressure limit affected the reflectivity performance.…”

Surface and Electrical Characterization of Non-Stoichiometric Semiconducting Thin-Film Coatings Based on Ti-Co Mixed Oxides Obtained by Gas Impulse Magnetron Sputtering

“…Targets with Ti-Co compositions of 2 at.%, 1 50 at.% Co were used in the preparation. Targets were prepared using spark p tering (SPS) with a system provided by FCT GmbH (Rauenstein, Germany) [5 sintering, Co and Ti nanopowders (99.95%, Kurt Lesker, Dresden, Germany Lukasiewicz Research Network-Institute of Non-Ferrous Metals [46,57] were A detailed description of the Ti-Co target preparation method can be found in publication [48]. Multimagnetron configuration allowed for the deposition o films with varying Co content (3 at.%, 19 at.%, 44 at.%, and 60 at.%).…”

“…For sintering, Co and Ti nanopowders (99.95%, Kurt Lesker, Dresden, Germany) from the Lukasiewicz Research Network-Institute of Non-Ferrous Metals [46,57] were employed. A detailed description of the Ti-Co target preparation method can be found in a separate publication [48]. Multimagnetron configuration allowed for the deposition of (Ti,Co)O x films with varying Co content (3 at.%, 19 at.%, 44 at.%, and 60 at.%).…”

“…The transmission coefficient (T λ ) of TiO 2 in a form of anatase or rutile is generally around 80%. Unfortunately, such high transparency occurs with high resistivity [48]. The dielectric nature of such materials poses a problem, limiting the potential applications of these materials, such as their use in gas sensing devices, transparent oxide semiconductors, and more.…”

Structure and Performance Optimization of Co Magnetic Thin Films Deposited by Vacuum Evaporation Coating

“…Co magnetic thin films were deposited on a Mgo substrate using magnetron sputtering; to avoid Co film oxidation, a layer of Cr was used to be the buffer layer [24]. Moreover, some researchers have used magnetron sputtering to prepare Ti and Co-based metal and oxide thin film coatings and discussed the effect of Co content variation on the magnetic properties of the films [25]. Considering the effect of temperature on magnetic films, polycrystalline Co2FeGe magnetic films were successfully prepared by the magnetron sputtering technique, and the effect of postdeposition annealing temperature on structural, static, and dynamic magnetic properties was systematically investigated [26].…”