Properties of metal doped tungsten oxide thin films for NOx gas sensors grown by PLD method combined with sputtering process

Kawasaki, Hiroharu; Ueda, Tsuyoshi; Suda, Yoshiaki; Ohshima, Tamiko

doi:10.1016/j.snb.2003.12.052

Cited by 89 publications

(43 citation statements)

References 23 publications

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“…Specifically, two major strategies have been used to improve sensor performance: i) WO 3 in combination with catalytic metals [8][9][10] and ii) metal-oxide composite formulations with the use of a metal-oxide cocatalyst [11][12][13][14]. The present work reports the latter as the experimental strategy to enhance the sensing profile of WO 3 , specifically using novel (CuWO 4 ) thin-films.…”

Section: Introductionmentioning

confidence: 96%

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Copper tungstate thin-films for nitric oxide sensing

Gonzalez

Dunford

et al. 2012

Sensors and Actuators B: Chemical

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/npsi/ctrl?lang=en http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/ctrl?lang=fr Access and use of this website and the material on it are subject to the Terms and Conditions set forth at http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/jsp/nparc_cp.jsp?lang=en NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous.http://dx.doi.org/10.1016/j.snb.2012.06.067 Sensors and Actuators B: Chemical, 173, pp. 169-176, 2012-07-08 Copper tungstate thin-films for nitric oxide sensing Gonzalez, C. M.; Du, X.; Dunford, J. L.; Post, M. L.

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Section: Introductionmentioning

confidence: 96%

“…Previous studies have shown that WO 3 is a material highly suited for the real-time monitoring of gas-phase pollutants (conductometric sensing phase), particularly for NO x monitoring [6][7][8][9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Copper tungstate thin-films for nitric oxide sensing

Gonzalez

Dunford

et al. 2012

Sensors and Actuators B: Chemical

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“…We also have been studied thin film preparation using plasma processing technique include hard coating, such as TiN, TiC, WC, cBN, CN, etc. [12][13][14][15]. In order to improve the properties of the super hard material surface on the long cylinder rod, carbon thin films including DLC were prepared on the carbide steel cylinder rod by new magnetron sputtering deposition method using modulated magnetic …”

Section: Introductionmentioning

confidence: 99%

Surface coating on the cylinder rod using sputtering deposition method with modulated magnetic field

Kawasaki

Ohshima

Yagyu

et al. 2011

Trans. Mat. Res. Soc. Japan

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Carbon thin films were prepared on the carbide steel cylinder rod using new magnetron sputtering deposition method to prevent their corrosion and/or increasing friction coefficient. In this method, plasmas move toward axial direction using modulated magnetic field which was generated by low frequency alternating coil current. Experimental results suggest surface roughness of the film decreased to ~10 nm from >100 nm (substrate) by this deposition. Uniformity of the ion saturation current and film thickness increased by modulated magnetic field. Deposition rate of carbon films prepared using RF discharge at 50 W was higher than that using DC discharge at 500 V and 30mA, however hardness of the film prepared by DC discharge was higher than that by RF discharge.

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“…Tungsten oxide is one of the most extensively studied materials in the field of photocatalysis, as the working electrode in electrochromic devices and gas sensors [1][2][3][4][5][6]. In the bulk, pure tungsten oxide has an indirect band gap of 2.6 eV.…”

Section: Introductionmentioning

confidence: 99%

Nitrogen ion implantation and characterization of tungsten oxide films

Tesfamichael

Bell

2005

SPIE Proceedings

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This paper implements modification of tungsten oxide film using ion implantation and a physical characterization of the film. The film was implanted with nitrogen at energies between 10 keV and 40 keV and ion dose range 10 14 -10 16 cm -2 .The surface morphology of the film after implantation has been modified as observed using electron microscopy. The transmittance of the film was found to decrease with increasing implantation energy and ion dose as measured using conventional spectrophotometer. Depth profile of nitrogen was analyzed using Secondary Ion Mass Spectroscopy (SIMS) and found a peak of nitrogen across the depth of the implanted layer. The amount of nitrogen was found to increase with increasing ion dose and energy. From electron diffraction a broader diffraction rings were revealed from both the implanted and un-implanted layers, indicating that the crystalline properties of the tungsten oxide film after ion implantation remains the same.

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Properties of metal doped tungsten oxide thin films for NOx gas sensors grown by PLD method combined with sputtering process

Cited by 89 publications

References 23 publications

Copper tungstate thin-films for nitric oxide sensing

Copper tungstate thin-films for nitric oxide sensing

Surface coating on the cylinder rod using sputtering deposition method with modulated magnetic field

Nitrogen ion implantation and characterization of tungsten oxide films

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