2015
DOI: 10.1016/j.matlet.2015.04.088
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Properties and preparation of Li–La–Ti–Zr–O thin film electrolyte

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Cited by 31 publications
(17 citation statements)
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“…However, the careful selection of solid electrolyte materials and their integration to full solid state microbattery designs are still to be made giving perspective for fast Li diffusion and highest energy density for safe energy storage. -based thin film in-plane conductivity [45][46][47][48][49][50][51][52][53][54][55][56] , compared to the bulk conductivity measured on a home-made cubic-garnet Li 6.19 Al 0.28 La 3 Zr 1.75 Ta 0.25 O 12 pellet.…”
Section: Opportunities For Microbattery Designs: All-solid State Ceramentioning
confidence: 99%
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“…However, the careful selection of solid electrolyte materials and their integration to full solid state microbattery designs are still to be made giving perspective for fast Li diffusion and highest energy density for safe energy storage. -based thin film in-plane conductivity [45][46][47][48][49][50][51][52][53][54][55][56] , compared to the bulk conductivity measured on a home-made cubic-garnet Li 6.19 Al 0.28 La 3 Zr 1.75 Ta 0.25 O 12 pellet.…”
Section: Opportunities For Microbattery Designs: All-solid State Ceramentioning
confidence: 99%
“…Despite the knowledge gained on LLZO pellet fabrication and synergy of lattice structure evolution and Li-transfer, the transferability of LLZO to thin film structures remains challenging. Only a few attempts to produce garnet-based thin films have been reported, which we review in Table 1: These are mainly LLZO garnet-type structures being undoped or doped with Al, Y or Ta and deposited by either sol-gel [45][46][47] , sputtering [48][49][50] , metal-organic or CO 2 -laser assisted chemical vapor deposition (MO-CVD, LA-CVD) [51,52] or pulsed laser deposition (PLD) [53][54][55][56] . Figure 1b summarizes their Arrhenius-type conductivity characteristics.…”
Section: Li-garnet Solid State Electrolyte Materials: Perspectives Fomentioning
confidence: 99%
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“…With all production techniques, films can be fabricated with an activation energy of 0.3-0.4 eV. Comparison of conductivity and activation energy of samples obtained by different production methods (solid state, [7,70, tape casting, [15][16][17][18][19]21,[23][24][25][26] sol-gel, [93,[121][122][123][124][125][126][127][128][129][130][131][132][133][134] PLD, [30,31,[33][34][35][36]38,44] RF sputtering, [39,40,[43][44][45]135] ALD, [46] chemical vapor deposition (CVD), [28,29] and PAD [62,73,136] ) for the (doped) LLZO solid electrolyte depending on the production resp. annealing temperature.…”
Section: Comparison With Other Production Methodsmentioning
confidence: 99%
“…Furthermore, an exact temperature control is necessary to achieve thin planar ceramic plates without deformation. [25][26][27] Alternative fabrication methods like metal organic chemical vapor deposition (MO-CVD), [28,29] pulsed laser deposition (PLD), [17,[30][31][32][33][34][35][36][37][38] radio frequency (RF) sputtering, [39][40][41][42][43][44][45] and atomic layer deposition (ALD) [46] have been investigated to produce films in a nanometer scale. However, all these coating techniques…”
mentioning
confidence: 99%