“…If the encapsulant with a relatively low volume resistivity on the order of 10 14 Ω cm, such as ethylene-vinyl acetate (EVA), is used, leakage current flows from the Al frame to the PV cells accompanied by a drift of Na from the cover glass to the PV cell. Such Na drift by a high electric field and migration to the pn junction in the PV cells are one of the possible origins of PID for p-type crystalline Si PV modules, [4][5][6][7] although PID is merely a generic name for the degradation induced by the potential difference between the Al frame and the PV cells, and the degradation behavior and mechanism of PID are essentially different for different types of PV cells: for p-type crystalline Si, 1,2,7,8) possibly due to the migration of Na; for n-type crystalline Si, [9][10][11][12] possibly due to charge recombination; for Si heterojunction, 13,14) due to the reduction of transparent conductive oxide (TCO) layer; thin-film Si, 15) due to the delamination of the TCO layer, Cu(In,Ga)Se 2 , 16,17) CdTe, 18) and others. Such mechanisms are still controversial in spite of much effort using various kinds of tools and techniques devoted to clarifying the main origins of PID.…”