Alternative Lithographic Technologies IV 2012
DOI: 10.1117/12.916525
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Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Abstract: A photomask design flow for generating guiding patterns used in graphoepitaxial DSA processes is proposed and tested. In this flow, a new fast DSA model is employed for DSA structure verification. The execution speed and accuracy of the fast model were benchmarked with our previously reported Monte Carlo method. We demonstrated the process window verification using the OPC/DSA flow with the fast DSA model and compared this with experimental results in the guiding patterns simulated by e-beam lithography.

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Cited by 19 publications
(15 citation statements)
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“…Several recent experimental studies successfully demonstrated the capability of DSA to produce cylindrical domains within larger guiding holes . Using a 70:30 poly(styrene‐ b ‐methylmethacrylate) (PS‐ b ‐PMMA with M n = 46.1 kg/mol for PS and M n = 21 kg/mol for PMMA) confined inside guiding templates with a CD of 51 nm, Yi et al produced contact holes with a diameter of 15 nm and a registration accuracy of 1 nm.…”
Section: Introductionmentioning
confidence: 99%
“…Several recent experimental studies successfully demonstrated the capability of DSA to produce cylindrical domains within larger guiding holes . Using a 70:30 poly(styrene‐ b ‐methylmethacrylate) (PS‐ b ‐PMMA with M n = 46.1 kg/mol for PS and M n = 21 kg/mol for PMMA) confined inside guiding templates with a CD of 51 nm, Yi et al produced contact holes with a diameter of 15 nm and a registration accuracy of 1 nm.…”
Section: Introductionmentioning
confidence: 99%
“…While several recent experimental studies [8][9][10] successfully demonstrated the capability of DSA to produce cylindrical domains within larger guiding holes, DSA for non-cylindrical contact holes has received little attention. Extensive studies of the large parameter spaces encountered in both cylindrical and non-cylindrical VIA lithography are still to be carried out.…”
Section: Introductionmentioning
confidence: 99%
“…Beyond hole shrink, interest in DSA also lies in contact multiplication by producing several cylinders at desired locations within a single guiding templates. An example of such a situation and the subject of this study, includes elongated templates where single rows of multiple cylinders can self-assemble and produce VIAs with reduced CD and pitch [12][13] . We use three-dimensional self-consistent field theory (SCFT) simulations to investigate the detailed structure of the microdomain ordering and the factors leading to cylindrical morphologies in contact holes [14][15] .…”
Section: Introductionmentioning
confidence: 99%