Programmable uniformity correction by using plug-in finger arrays in advanced lithography system

Illumination-integrated nonuniformity (IINU) is a key factor in determining resolution and critical dimension uniformity, which are important performance parameters in advanced lithography systems. To further reduce the IINU, a uniformity correction technology was adopted. In this paper, a low-cost and simple-structure approach for uniformity correction with higher flexibility and better correction capability is proposed. The method is composed of two dynamic gray filters with a specific transmittance distribution, which can form different correction curves by controlling the displacement of the gray filters. The frequency limitation of the defocus uniformity correction system is analyzed. A uniformity correction system design method based on the particle swarm optimization algorithm is introduced. Based on the proposed method, a dynamic gray filter uniformity correction system is applied to an illumination optical system. The experimental results show that the value of the corrected IINU reaches less than 0.7%, which satisfies the IINU requirements of advanced lithography systems. This verifies the higher flexibility and better correction capability of the proposed method.

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Programmable uniformity correction by using plug-in finger arrays in advanced lithography system

Cited by 4 publications

References 14 publications

Method for illumination uniformity correction in the illumination system of lithography

Method for illumination uniformity correction in the illumination system of lithography

Study on the highly intelligent uniformity correction and the application for lithography

Illumination uniformity correction by using dynamic gray filters in a lithography system

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