Programmable Soft Lithography: Solvent-Assisted Nanoscale Embossing

Lee, Min Hyung; Huntington, Mark D.; Zhou, Wei; Yang, Jing-Tang; Odom, Teri W.

doi:10.1021/nl102206x

Cited by 145 publications

(134 citation statements)

References 23 publications

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“…8 This is a demonstration of integrating photolithography with the shrink process of patterning at a larger scale and then shrinking to create rounded, high aspect ratio structures. 10 As in a previous study, 11 the ability illustrated here to shrink photoresist features suggests that we can beat the heretofore inherent optical resolution of "top-down" processing with an extra >20 x improvement in size reduction. In addition to demonstrating the compatibility of this process with photolithography, we obviate the need for an expensive chrome mask and a cleanroom altogether.…”

supporting

confidence: 69%

Sequential shrink photolithography for plastic microlens arrays

Dyer

Shreim

Jayadev

et al. 2011

Applied Physics Letters

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Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children's toy Shrinky Dinks by simply printing dots using a standard desktop printer. Upon retraction of this pre-stressed thermoplastic sheet, the dots shrink to a fraction of their original size, which we then lithographically transfer onto photoresist-coated commodity shrink wrap film. This shrink film reduces in area by 95% when briefly heated, creating smooth convex photoresist bumps down to 30 lm. Taken together, this sequential shrink process provides a complete process to create microlenses, with an almost 99% reduction in area from the original pattern size. Finally, with a lithography molding step, we emboss these bumps into optical grade plastics such as cyclic olefin copolymer for functional microlens arrays.

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supporting

confidence: 69%

Sequential shrink photolithography for plastic microlens arrays

Dyer

Shreim

Jayadev

et al. 2011

Applied Physics Letters

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“…The structures are formed by first imprinting a square array of sub-wavelength cylindrical depressions [19][20][21] on the surface of a thin polymer film cast on a glass substrate coated with a layer of gold. Blanket deposition of a thin layer of gold on the imprinted surface of the polymer completes the fabrication.…”

Section: Resultsmentioning

confidence: 99%

Coupling of plasmonic and optical cavity modes in quasi-three-dimensional plasmonic crystals

et al. 2011

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The field of plasmonics has emerged as an interesting area for fundamental studies, with important application possibilities in miniaturized photonic components. Plasmonic crystals are of particular relevance because of large field enhancements and extraordinary transmission that arise from plasmonic interactions between periodic arrays of metallic elements. Here we report methods to enhance and modify the plasmonic resonances in such structures by strongly coupling them to optical modes of Fabry-Perot type cavities. First, we illustrate a type of plasmonic, narrow-band (~15 nm), high-contrast ( > 20 dB) absorber and an opto-fluidic modulator based on this component. second, we use optimized samples as substrates to achieve strong amplification ( > 350%) and modulation ( > 4×) of surface-enhanced Raman scattering from surface-bound monolayers. Cavity-coupling strategies appear to be useful not only in these two examples, but also in applications of plasmonics for optoelectronics, photovoltaics and related technologies.

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“…[232] For several applications, the placement of such nanoparticles in a symmetric lattice is of crucial importance. As examples, platinum nanoparticles can then serve as etching masks to create highly ordered arrays of silicon nanopillars or nanoholes [121] while gold nanoparticle arrays have been used in plasmonics, [233] catalysis, [232] the generation of protein arrays [234] and to study cellsurface interactions. [16,235] Novel data storage devices might arise from the controlled placement of magnetic nanoparticles in symmetric arrays.…”

Section: Introductionmentioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Programmable Soft Lithography: Solvent-Assisted Nanoscale Embossing

Cited by 145 publications

References 23 publications

Sequential shrink photolithography for plastic microlens arrays

Sequential shrink photolithography for plastic microlens arrays

Coupling of plasmonic and optical cavity modes in quasi-three-dimensional plasmonic crystals

Surface Patterning with Colloidal Monolayers

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