Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission

Ohtsu, Yasunori; Fujita, Hiroharu

doi:10.1063/1.2917795

Cited by 30 publications

(33 citation statements)

References 9 publications

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“…For example, the effects of the hole diameter (ranging from 0 to 10 mm), the driving frequency and gas composition on the RF MH cathode discharge have been studied by several authors [29,30,32,33]. Ohtsu et al [34] have used MH cathode discharges with small diameter (D = 5 mm) and depth (W = 15 mm) of holes to achieve the high-growth rate of amorphous hydrocarbon (a-C:H) thin films. In reference [35], the authors used the parallel plates form of an RF hollow cathode, with cathode-to-cathode distance equal to 45 mm for deposition of diamond like carbon (DLC) thin films.…”

Section: Introductionmentioning

confidence: 99%

Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode

Djerourou

Djebli

Ouchabane

2019

Eur. Phys. J. Appl. Phys.

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This work deals with a comparative study of plasma discharge generated by two geometrical configurations of cathodes through an investigation of their plasma parameters. A large hole diameter and depth (D = 40 mm, W = 50 mm) multi-hollow (MH) cathode compared with a plane (PL) cathode are presented for argon capacitively coupled radiofrequency discharge. The electrical characteristics of MH and PL cathodes have been measured in terms of the self-bias voltage (Vdc) while the Langmuir probe was used to measure electron density (ne) and electron temperature (Te) for a wide range of gas pressure (60–400 mTorr) and incident power (50–300 W). It is found that the hollow cathode effect (HCE) is optimum at 60 mTorr with 220 mTorr as a critical gas pressure for which a transition from HCE to insufficient HCE is seen. The electron temperature varies from 3 to 5 eV in the case of MH and PL cathodes with respect to incident power and gas pressure.

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Section: Introductionmentioning

confidence: 99%

Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode

Djerourou

Djebli

Ouchabane

2019

Eur. Phys. J. Appl. Phys.

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“…The maximum value for the latter case is ten times higher than that for the former case. This is caused by the previously proposed high secondary‐electron emission 8. This value is the best data in the capacitively coupled plasma CVD using pure methane gas.…”

Section: Resultsmentioning

confidence: 58%

“…This is caused by the previously proposed high secondaryelectron emission. [8] This value is the best data in the capacitively coupled plasma CVD using pure methane gas. Figure 3 shows the radial profile of the deposited films for hollow electrodes of set-ups A and E. Here, the methane gas pressure is 5 Pa, the injected RF power is 200 W, and the substrate biased voltage V b ¼ À300 V. The process time is 60 min.…”

Section: Resultsmentioning

confidence: 75%

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Production of High‐Density Capacitively Coupled Plasma with RF Multi‐Hollow Cathode and/or High Secondary Electron Emission for DLC Film Preparation

Ohtsu

Nakamura

Misawa

et al. 2009

Plasma Processes & Polymers

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The effects of a hollow cathode discharge and secondary electron emission from a radio‐frequency‐biased electrode on the growing rate of diamond‐like carbon films were studied. The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm·min−1 was attained at a voltage of −700 V with radio‐frequency plasma using CH4 gas. Because of its non‐uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 µm, was obtained with the best arrangement.

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“…Ohtsu and Fujita also found that high density capacitively coupled plasma (CCP) with electron density of 10 11 cm À3 can be produced with the effect of high SEE coefficient. 14 Recently, Lafleur et al investigated the discharge phenomenon in low pressure RF discharge using a simple analytical model together with a 1D particle in cell simulation. Their results indicated that it is possible to generate an asymmetric plasma response in a geometrically symmetric, RF capacitive plasma.…”

Section: Introductionmentioning

confidence: 99%

Numerical study of effect of secondary electron emission on discharge characteristics in low pressure capacitive RF argon discharge

Liu

Samir

et al. 2014

Physics of Plasmas

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Based on the drift and diffusion approximation theory, a 1D fluid model on capacitively coupled RF argon glow discharge at low pressure is established to study the effect of secondary electron emission (SEE) on the discharge characteristics. The model is numerically solved by using a finite difference method and the numerical results are obtained. The numerical results indicate that when the SEE coefficient is larger, the plasma density is higher and the time of reaching steady state is longer. It is also found that the cycle-averaged electric field, electric potential, and electron temperature change a little as the SEE coefficient is increased. Moreover, the discharge characteristics in some nonequilibrium discharge processes with different SEE coefficients have been compared. The analysis shows that when the SEE coefficient is varied from 0.01 to 0.3, the cycle-averaged electron net power absorption, electron heating rate, thermal convective term, electron energy dissipation, and ionization all have different degrees of growth. While the electron energy dissipation and ionization are quite special, there appear two peaks near each sheath region in the discharge with a relatively larger SEE coefficient. In this case, the discharge is certainly operated in a hybrid α-γ-mode.

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Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission

Cited by 30 publications

References 9 publications

Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode

Plasma parameters of RF capacitively coupled discharge: comparative study between a plane cathode and a large hole dimensions multi-hollow cathode

Production of High‐Density Capacitively Coupled Plasma with RF Multi‐Hollow Cathode and/or High Secondary Electron Emission for DLC Film Preparation

Numerical study of effect of secondary electron emission on discharge characteristics in low pressure capacitive RF argon discharge

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