“…Ti thin films were made with a substrate temperature of and 8 Â10 À3 Pa and a deposition rate between 20-25 Å/s. Once the titanium film is deposited on the substrates, and without loosing vacuum inside the deposition chamber, the samples were impregnated with deuterium under controlled temperature, time and D 2 pressure conditions [10,13,14]. The deuterium pressure (P D 2 ) varied between 0.1 Â10 5 Pa, 0.5 Â10 5 Pa and 1.0 Â10 5 Pa, the substrate temperature (T s ) was taken within 373 K and 473 K, and the exposure time (t e ) was set among 0.5 h, 1 h and 2 h. Since deuterium concentration may not reach the stoichiometric relation of two deuteriums per each titanium, due to the inherent experimental performance, we will refer to it as TiD x samples.…”