2009
DOI: 10.1016/j.nimb.2009.08.019
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Production and characterization of oxygen-reduced implanted 21Ne targets

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Cited by 4 publications
(2 citation statements)
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References 29 publications
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“…This allowed to produce, in a single irradiation, more than one implanted target with uniform implantation along the backing surface. Previous investigations on the implantation of neon gas showed that tantalum backings provide high saturation concentrations (between 10 17 and 10 18 atoms/cm 2 ) and a good stability of the implantation against beam irradiation [22][23][24][25].…”
Section: B Targetsmentioning
confidence: 99%
“…This allowed to produce, in a single irradiation, more than one implanted target with uniform implantation along the backing surface. Previous investigations on the implantation of neon gas showed that tantalum backings provide high saturation concentrations (between 10 17 and 10 18 atoms/cm 2 ) and a good stability of the implantation against beam irradiation [22][23][24][25].…”
Section: B Targetsmentioning
confidence: 99%
“…One of the most effective technique to produce targets which are isotopically pure and can withstand high beam load over a long time is implantation technique [11,12]. 14 N 3+ ions of energy 75 keV from the ECR (Electron Cyclotron Resonance) ion source of the low energy ion accelerator [13][14][15][16] at Tata Institute of Fundamental Research (TIFR), Mumbai, were implanted into 0.30(5) mm thick Ta backing.…”
Section: A the Implanted Targetmentioning
confidence: 99%