Production and characterization of high-pressure microwave glow discharge in a microgap aiming at VUV light source

Kono, Akihiro; Wang, J.; Aramaki, Mitsutoshi

doi:10.1016/j.tsf.2005.08.036

Cited by 23 publications

(20 citation statements)

References 5 publications

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“…Since then, microplasma research has grown very rapidly, as evidenced by the increasing number of publications,4–8 the organisation of an International Workshop on Microplasmas,9 and the appearance of dedicated sections in major international plasma conferences. The continued research has broadened the application spectrum of microplasmas, which has included bio‐medical applications,10–15 displays,16 radiation sources,17–20 micro‐chemical analysis systems,21, 22 gas analyzers,23, 24 photodetectors,25 microlasers,26 dynamic millimetre and microwave devices,27–29 microreactors,30–34 propulsion systems,35–37 aerodynamic flow control,38, 39 material processing,40–44 and environmental applications 14, 45, 46…”

Section: Introductionmentioning

confidence: 99%

Microplasmas: Sources, Particle Kinetics, and Biomedical Applications

Iza

Kim

Lee

et al. 2008

Plasma Processes & Polymers

475

339

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Thanks to their portability and the non‐equilibrium character of the discharges, microplasmas are finding application in many scientific disciplines. Although microplasma research has traditionally been application driven, microplasmas represent a new realm in plasma physics that still is not fully understood. This paper reviews existing microplasma sources and discusses charged particle kinetics in various microdischarges. The non‐equilibrium character highlighted in this manuscript raises concerns about the accuracy of fluid models and should trigger further kinetic studies of high‐pressure microdischarges. Finally, an outlook is presented on the biomedical application of microplasmas.

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Section: Introductionmentioning

confidence: 99%

Microplasmas: Sources, Particle Kinetics, and Biomedical Applications

Iza

Kim

Lee

et al. 2008

Plasma Processes & Polymers

475

339

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“…Microwave microplasma sources [9][10][11][12][13][14][15][16][17][18][19][20], while more complex to design, can provide some tangible benefits. For example, microwave-driven electrodes can sustain a discharge with lower potentials, which in turn reduces sputtering of the electrodes and significantly prolongs the lifetime of the device.…”

Section: Introductionmentioning

confidence: 99%

Instability control in microwave-frequency microplasma

Miura

Hopwood

2012

Eur. Phys. J. D

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Abstract. Atmospheric argon microplasmas driven by 1.0 GHz power were studied by microwave circuit analyses and spatially-resolved optical diagnostics. These studies illuminate the mechanisms responsible for microplasma stability. A split-ring resonator (SRR) microplasma source is demonstrated to reflect excess microwave power, preventing the ionization overheating instability while limiting electron density to approximately 1 × 10 14 cm −3 and OH rotational temperature to 760 K at 0.76 W. Providing the SRR microplasma with an electrical path to ground, however, allows the microplasma to transition from the SRR mode to the so-called transmission line mode (T-line). This transition is due to matching of the microplasma and transmission line impedances. The higher power T-line mode supports a more intense microplasma with electron density of 1 × 10 15 cm −3 and OH rotational temperature of 1480 K with 15 W absorbed power. While the SRR mode is optimized for ignition and sustaining a stable nonequilibrium plasma, and T-line mode is better suited for driving a hot, high density microplasma. The estimated microwave discharge voltages were 15 V and 35 V in SRR mode and T-line mode, respectively, and the voltages are rather independent of input power. Microplasma stability is due to a combination of impedance mismatching and direct control of power, both inherent to microwave circuitry.

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“…Microplasmas have attracted a great deal of attention, partly due to their possible applications in the fields of analytical chemistry, 1,2 light sources, 3 surface patterning and modification, 4,5 and thin film growth. [6][7][8] However, microdischarges are also a cost-effective way of plasma generation at atmospheric pressure, which work at lower powers ͑5-50 W͒ compared to other atmospheric pressure plasma sources.…”

Section: Introductionmentioning

confidence: 99%

Optical and electrical characterization of an atmospheric pressure microplasma jet for Ar∕CH4 and Ar∕C2H2 mixtures

Yanguas‐Gil

Focke

Benedikt

et al. 2007

Journal of Applied Physics

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Characterization of the behavior of chemically reactive species in a nonequilibrium inductively coupled argonhydrogen thermal plasma under pulse-modulated operation A rf microplasma jet working at atmospheric pressure has been characterized for Ar, He, and Ar/ CH 4 and Ar/ C 2 H 2 mixtures. The microdischarge has a coaxial configuration, with a gap between the inner and outer electrodes of 250 m. The main flow runs through the gap of the coaxial structure, while the reactive gases are inserted through a capillary as inner electrode. The discharge is excited using a rf of 13.56 MHz, and rms voltages around 200-250 V and rms currents of 0.4-0.6 A are obtained. Electron densities around 8 ϫ 10 20 m −3 and gas temperatures lower than 400 K have been measured using optical emission spectroscopy for main flows of 3 slm and inner capillary flows of 160 SCCM. By adjusting the flows, the flow pattern prevents the mixing of the reactive species with the ambient air in the discharge region, so that no traces of air are found even when the microplasma is operated in an open atmosphere. This is shown in Ar/ CH 4 and Ar/ C 2 H 2 plasmas, where no CO and CN species are present and the optical emission spectroscopy spectra are mainly dominated by CH and C 2 bands. The ratio of these two species follows different trends with the amount of precursor for Ar/ CH 4 and Ar/ C 2 H 2 mixtures, showing the presence of distinct chemistries in each of them. In Ar/ C 2 H 2 plasmas, CH x species are produced mainly by electron impact dissociation of C 2 H 2 molecules, and the CH x /C 2 H x ratio is independent of the precursor amount. In Ar/ CH 4 mixtures, C 2 H x species are formed mainly by recombination of CH x species through three-body reactions, so that the CH x /C 2 H x ratio depends on the amount of CH 4 present in the mixture. All these properties make our microplasma design of great interest for applications such as thin film growth or surface treatment.

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Production and characterization of high-pressure microwave glow discharge in a microgap aiming at VUV light source

Cited by 23 publications

References 5 publications

Microplasmas: Sources, Particle Kinetics, and Biomedical Applications

Microplasmas: Sources, Particle Kinetics, and Biomedical Applications

Instability control in microwave-frequency microplasma

Optical and electrical characterization of an atmospheric pressure microplasma jet for Ar∕CH4 and Ar∕C2H2 mixtures

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