Processing Uniformity Improvement by Magnetic Field Distribution Control in Electron Cyclotron Resonance Plasma Chamber

Abstract

A novel electron cyclotron resonance (ECR) processing apparatus has been developed to improve processing uniformity by adjusting the plasma refractive index determined by the magnetic field distribution in the ECR plasma chamber. With SiO2 deposition, an excellent uniformity of ±1% for six-inch wafers and ±2% for eight-inch wafers has been obtained. The conditions required for specimen processing, such as perpendicular ion incidence, can be selected independently of uniformity because uniformity is controlled only at the plasma generation region. This method can also be applied to other ECR techniques, such as ECR ion-stream etching.

Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets

“…This example illustrates how the three basic requirements help one optimize a plasma source. 6. CONCLUSIONS Guided by a computer simulation, we have discussed methods for sustaining low-pressure microwave plasmas in which ionization is by high-energy electrons confined to permanent-magnet traps.…”

“…In a magnetic field, transverse electron diffusion is caused by collisions with neutrals and ions and so is less intense at lower pressures [3,4]. Magnetic traps often employ electromagnets because these allow one to easily adjust the magnetic field and trap parameters [5][6][7]. On the other hand, such designs are rather cumbersome, requiring a high-power current source and, usually, water cooling.…”

“…On the other hand, such designs are rather cumbersome, requiring a high-power current source and, usually, water cooling. An alternative approach is to use strong permanent magnets [6,7]. Such traps are preferable in many cases as no current source is required.…”

An investigation of the heating of electrons in multipolar magnet systems and design of low-pressure electron-cyclotron-resonance microwave-frequency reactors

“…The diffusion of electrons across the magnetic field in magnetized plasma, which is due to their collisions with neutrals and ions, decreases with decreasing pressure at a constant density of plasma [4,5]. Magnetic traps in MW reactors are often developed using electromagnets [6][7][8] which require a high-power current source and, as a rule, water cooling of the turns. Such magnet systems are very bulky; however, they offer a possibility of simple variation of the magnetic field and of the parameters of magnetic trap.…”

The Heating of Electrons in Magnetic Traps of Low-Pressure Electron-Cyclotron-Resonance Microwave-Frequency Reactors

“…The diffusion of electrons across the magnetic field in magnetized plasma, which is due to their collisions with neutrals and ions, decreases with decreasing pressure [4,5]. Magnetic traps in MW reactors are often developed with the aid of electromagnets [6][7][8] which require a high-power current source and, as a rule, water cooling of the turns. Such magnet systems are very bulky; however, they offer a simple method of varying the magnetic field and the parameters of magnetic trap.…”