Processing and Study of Optical and Electrical Properties of (Mg, Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application

Abed, Chayma; Fernández, S.; Aouida, S.; Elhouichet, Habib; Priego, Fernando; Castro, Yolanda; Gómez-Mancebo, M. Belén; Munuera, Carmen

doi:10.3390/ma13092146

Cited by 19 publications

(8 citation statements)

References 42 publications

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“…The average crystallite size (D), microstrain (e), and dislocation density ( ) d of the as-deposited films were estimated using the following equations [38]:…”

Section: Microstructural Studymentioning

confidence: 99%

Combined Effects of Ultraviolet Irradiation and Magnetic Field on the Properties of Dip-coated ZnO thin films

Chalabi,

Loucif,

Alarfaj

2023

Mater. Res. Express

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In this study, four ZnO thin films were deposited on FTO substrates using the sol–gel dip coating method to examine their microstructural, morphological, and optical properties through various techniques. Three of them were subjected to ultraviolet (UV) light, magnetic field (MF), and a combination of UV and MF during deposition, referred as ZnO: UV, ZnO: MF, and ZnO: (UV+MF), respectively. The results obtained showed that the simultaneous UV and MF exposure improved the crystallinity and surface homogeneity of the as-deposited film. Moreover, ZnO: (UV+MF) film exhibited an average transparency of 80% in the visible region and a high optical bandgap (3.67 eV). Room-temperature photoluminescence (PL) spectra revealed a weak UV emission and a strong violet emission peaks for all films. However, the violet emission intensity being lower in ZnO: UV and ZnO: MF films due to a reduction in zinc interstitials (Zni) defects, The simultaneous UV and MF exposure did not reduce Zni defects, and the violet emission intensity was almost identical to that of the untreated film. These findings suggest that the ZnO: (UV+MF) film can be a promising candidate for the development of ultraviolet and violet lasers and light-emitting diodes.

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“…The average crystallite size (D), microstrain (e), and dislocation density ( ) d of the as-deposited films were estimated using the following equations [38]:…”

Section: Microstructural Studymentioning

confidence: 99%

Combined Effects of Ultraviolet Irradiation and Magnetic Field on the Properties of Dip-coated ZnO thin films

Chalabi,

Loucif,

Alarfaj

2023

Mater. Res. Express

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“…has studied the effect of RF magnetron on conventional solid state target based on ZnO-MgO:Al2O3 (10:2 wt %) material on glass and silicon substrates at the different working pressures. The resistivity of 8.8×10 −2 Ω• cm was achieved by the sample deposited at the lowest working pressure of 0.21 Pa. [26] Recently, annealing effect on the structural and optical behavior of (ZnO:Eu 3+ ) thin film growth been studied by Otieno et. al.…”

Section: Introductionmentioning

confidence: 99%

Study the Effect of ZnO/Cu/ZnO Multilayer Structure by RF Magnetron Sputtering For Flexible Display Applications

Das¹,

Roymahapatra²,

Nandi³

et al. 2021

ES Mater. Manuf.

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ZnO/Cu/ZnO multilayer structured glass and Polyethylene naphthalate (PEN) with different thickness of copper (Cu) layer were prepared by RF magnetron sputtering at room temperature. The electrical resistivity of the films were achieved 8.610 -5 •cm and 4.510 -4 •cm, carrier concentration of 5.3210 21 cm -3 and 1.3610 21 cm -3 , low sheet resistance of 12 /cm 2 and 16 /cm 2 respectively on glass and PEN substrate respectively with optical transmission of more than 80% for both cases at the optimum copper layer thickness. Conduction mechanism of the multilayer structure has been explained in terms of metal to oxide carrier injection with the variation of the thickness of the Cu layer. Different optimization procedures were used to achieve good optically transparent and electrically conductive films. The structural characterizations of multilayer films were carried out by X-ray diffraction (XRD); surface morphology, and topography were performed by scanning electron microscopy (SEM) and atomic force microscopy (AFM) respectively. The value of sheet resistance of the structure was influenced by the deposition condition of both layers. Effect of substrate and thickness of the Cu layer was investigated and illustrated.

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“…A slight doping using metallic ions enables energy traps formation through reserving the host phase-structure and the original vital properties of the photocatalysts. The increase in the trap centers and the transfer of photoinduced charge carries of the pollutant will accelerate the photodegradation process [20]. Such morphological and structural changes greatly affect its properties, leading to new electrochemical applications.…”

Section: Introductionmentioning

confidence: 99%

Promising Cr-Doped ZnO Nanorods for Photocatalytic Degradation Facing Pollution

et al. 2021

Self Cite

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Chromium (Cr)-doped zinc oxide (ZnO) nanorods with wurtzite hexagonal structure were prepared through a thermal decomposition technique. The concentration effect of the Cr doping on the structural, morphological, and optical properties of the ZnO nanorods was established by correlating various measurements: transmission electron microscopy (TEM), photoluminescence (PL), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and several UV-visible studies. The obtained nanorods were investigated as photocatalysts for the photodegradation process of methyl orange (MO), under UV-vis light illumination. Different weights and time intervals were studied. A 99.8% photodegradation of MO was obtained after 100 min in the presence of 1 wt.% Cr III acetate hydroxide and zinc acetate dehydrate “ZnO-Cr1”. The kinetic rate constant of the reaction was found to be equal to 4.451 × 10−2 min−1 via a pseudo-first order rate model. Scavenger radicals demonstrated the domination of OH• radicals by those of O2•− superoxide species during the photodegradation. The interstitial oxygen site Oi is proposed to play a key role in the generation of holes in the valence band under visible irradiation. The ZnO-Cr1 photocatalyst displayed good cycling stability and reusability.

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Processing and Study of Optical and Electrical Properties of (Mg, Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application

Cited by 19 publications

References 42 publications

Combined Effects of Ultraviolet Irradiation and Magnetic Field on the Properties of Dip-coated ZnO thin films

Combined Effects of Ultraviolet Irradiation and Magnetic Field on the Properties of Dip-coated ZnO thin films

Study the Effect of ZnO/Cu/ZnO Multilayer Structure by RF Magnetron Sputtering For Flexible Display Applications

Promising Cr-Doped ZnO Nanorods for Photocatalytic Degradation Facing Pollution

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