Processes Of Self Organization In Plasma Focus Discharges Final Phase

Abstract

distribution of D+ etched tracks (ion energy E 1.5 MeV) which form the image on the target. The impacting-plasma structure from the low-energy ions (E 5 50 keV) is obtained via oxidation of dangling bonds in the surface layers of monocrystals silicon targets. The scaling of pinch emission parameters with the capacitor bank energy W, is tested on three plasma focus machines (6 kJ 1. W 5 30 kJ) The image spatial resolution is