2004
DOI: 10.1007/s00542-002-0242-2
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Process research of high aspect ratio microstructure using SU-8 resist

Abstract: SU-8 is a negative, epoxy type, near-UV photoresist. This resist has been specifically developed for ultrathick, high-aspect-ratio MEMS-type applications using standard lithography equipment. However, in practice, SU-8 has shown to be very sensitive to process parameter variation. The orthogonal array was used in our experiments in order to improve the lithography quality and analyze the interaction among the parameters. The analyses show that the interaction between the exposure dose and post exposure bake ha… Show more

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Cited by 75 publications
(41 citation statements)
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“…16 However, SU8 has been proven to be very sensitive to process conditions 17 and one of the resulting consequences is the large internal stress generated during this process, 18 which causes feature distortion, dimensional change, and cracks. From this design, it was found that the post exposure bake temperature (PEB) and exposure area are important factors that define feature fidelity.…”
Section: Resultsmentioning
confidence: 99%
“…16 However, SU8 has been proven to be very sensitive to process conditions 17 and one of the resulting consequences is the large internal stress generated during this process, 18 which causes feature distortion, dimensional change, and cracks. From this design, it was found that the post exposure bake temperature (PEB) and exposure area are important factors that define feature fidelity.…”
Section: Resultsmentioning
confidence: 99%
“…2. To produce polydimethylsiloxane (PDMS) substrates with micro-channels, create an SU8 mold using standard lithography processes 5 . Note: The channel size is designed for each specific particle's dimension.…”
Section: Thermal Particle Detection (Tpd)mentioning
confidence: 99%
“…SU-8 is a negative, epoxy type, near-UV photoresist, which has been specifically developed for ultra-thick, high-aspect-ratio structures such as found in microelectromechanical systems (MEMS) that can be fabricated using standard lithography equipment [59]. SU-8 photoresist is called negative as the areas exposed to light become cross-linked and so remain on the substrate during the development while the unexposed areas are removed away after development.…”
Section: Fabrication Processmentioning
confidence: 99%