2013
DOI: 10.1007/s10825-013-0487-2
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Process modeling for doped regions formation on high efficiency crystalline silicon solar cells

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Cited by 6 publications
(5 citation statements)
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“…In the last years the simulation approach moved from 1D to 2D or 3D simulations, both for more accuracy and for particular architecture analysis, along with the increasing computational power available. The possibility to change every fabrication parameter in a wide range of values and to simulate numerically the actual performance is a strong enhancement in the design process [6,7].…”
Section: Introductionmentioning
confidence: 99%
“…In the last years the simulation approach moved from 1D to 2D or 3D simulations, both for more accuracy and for particular architecture analysis, along with the increasing computational power available. The possibility to change every fabrication parameter in a wide range of values and to simulate numerically the actual performance is a strong enhancement in the design process [6,7].…”
Section: Introductionmentioning
confidence: 99%
“…With this, we can keep the simple notation of (12) and do not have to account for the material-dependent terms. In equilibrium, (12) yields…”
Section: Interface Segregation Of Phosphorusmentioning
confidence: 99%
“…Complementary studies of P diffusion from glasses or spray-on sources [8]- [10] provide valuable information but are also not conclusive for postimplantation conditions due to the very different state of intrinsic defects at the onset of the annealing process. For the latter situation, only a few simulation studies have been published [11], [12].…”
mentioning
confidence: 99%
“…Different approaches have been proposed to improve the passivation/field effect compromise, for instance, improving cleaning [13], tuning the (i) a-Si:H layers structures and properties [17,18] or band management modifications using silicon based amorphous alloys [19][20][21][22].…”
Section: Introductionmentioning
confidence: 99%