Process conditions for complete decomposition of CHF3 in a dielectric barrier discharge reactor

Abstract

Plasma decomposition of CHF 3 was investigated using a dielectric barrier discharge immersed in an electrically insulating oil bath in a mixture of CHF 3 , O 2 , and N 2 . CHF 3 was well decomposed under a relatively high applied voltage in an atmospheric pressure plasma system. The main by-product was CO 2 and its selectivity increased with a decrease in the CHF 3 concentration in the feed. Complete decomposition of CHF 3 was achieved at a typical process range: an applied voltage ≥ 7.0 kVp, an initial CHF 3 flow rate of 3 ml/min, and a total flow rate of 500 ml/min. The value of energy efficiency and energy density at the center range for the complete decomposition of CHF 3 was 0.01 mmol/kJ and 6.00 kWh/Nm 3 , respectively.

Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane

“…However, the decomposition of CHF 3 in the N 2 dilution gas is an attractive and valuable process. 23,28 This is due to the fact that the feed gas is composed similar to an emission of CHF 3 in air. The result shows that Ar as a dilution gas for the decomposition of CHF 3 in a DBD would be energy-effective.…”