“…For instance, AOI close to the Brewster’s angle, θ B , are considered near optimal where the ellipsometry measurement is expected to exhibit high sensitivity − to the values of the fit parameters. Given that for silicon (Si), θ B ≈ 74° at λ ≈ 633 nm, − and partly for historical reasons, ellipsometric measurements of polymer thin films on Si substrates are commonly performed at an AOI ≈ 70°. ,,,,,, Similarly, for glass substrates, as the θ B ≈ 55° at λ ≈ 633 nm, , measurements are performed at an AOI ≈ 60°. , In summary, most measurements on thin films are performed at an AOI between 45° and 80°. ,,,− ,,− ,, Therefore, depending on the range of variation of the physical quantities under investigation, this necessitated preparatory experiments to identify the optimal AOI and λ at which the data were most sensitively dependent on the values of the parameters to be determined from the fits. ,,− , However, such preparatory experiments become unnecessary when using Variable Angle Spectroscopic Ellipsometry (VASE) capable of measuring at multiple AOI and λ.…”