2020
DOI: 10.1103/physrevresearch.2.013128
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Probing the breakdown of topological protection: Filling-factor-dependent evolution of robust quantum Hall incompressible phases

Abstract: The integer quantum Hall (QH) effects characterized by topologically quantized and nondissipative transport are caused by an electrically insulating incompressible phase that prevents backscattering between chiral metallic channels. We probed the incompressible area susceptible to the breakdown of topological protection using a scanning gate technique incorporating nonequilibrium transport. The obtained pattern revealed the filling-factor (ν)-dependent evolution of the microscopic incompressible structures loc… Show more

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Cited by 7 publications
(8 citation statements)
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“…1 c–e. Note that these SGM signatures do not originate from a direct coupling of the counterpropagating QHECs induced by the tip potential alone: this would yield iso-resistance stripes following the edge topography 24 , 29 . The absence of such stripes in SGM maps (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…1 c–e. Note that these SGM signatures do not originate from a direct coupling of the counterpropagating QHECs induced by the tip potential alone: this would yield iso-resistance stripes following the edge topography 24 , 29 . The absence of such stripes in SGM maps (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…A competing process due to elastic inter-LL interactions at high currents also give rise to Hall field-induced oscillations (HIRO) which have been investigated in QWs composed of GaAs [10][11][12], Ge/SiGe [13], and MgZnO/ZnO [14]. It is interesting to note that in GaAs QWs inter-LL processes can also manifest themselves as a breakdown of the integer quantum Hall effect [15][16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…This disorder-induced QH effect has been microscopically confirmed through scanning probe measurement [2,3] that showed compressible paddles interspersed with the IC bulk phase, namely, localized states. On the other hand, the IC along the edge of the 2DEG governed by edge confinement potential [4] and its robust ν-dependence have recently been microscopically demonstrated for the high mobility Hall bar device by our nonequilibrium-transport assisted scanning gate imaging [5].…”
mentioning
confidence: 96%
“…Hence, the tip (a nanoscale top gate) could perturb a microscopic landscape of the potential, resulting in a modification of the inter-LL tunneling. In the case of a high-mobility sample, the nanoscale top gate reduces the width of the IC region by bending the LLs locally and enhancing the inter LL tunneling, particularly through the innermost IC [5], leading to a further enhancement in the longitudinal resistance. Here, the tip-induced resistance change was measured as the longitudinal voltage (V xx ) at the constant source-drain current (I sd ) by a DC amplifier during scanning.…”
mentioning
confidence: 99%
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