Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet

Abstract

We use low coherence interferometry to investigate the depth structure of a complex multilayer stack reflector. The probing instrument is an interferometer based on a Fresnel's bi-mirror illuminated by relatively wide-band synchrotron undulator light near 13.5 nm. Simulations clearly confirm that our test object generates two back propagated signals that behave as if reflected on two effective planes. First results in this spectral range may open the way to a new physical approach to extreme ultraviolet sample characterization in the form of line-scan optical coherence tomography.

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

“…[6][7][8][9] Mo/Si MXMs lent impetus to the development of x-ray microscopes, 10,11 telescopes, 12,13 spectroscopes, 14,15 and interferometers. [16][17][18] They also found specific applications such as polarizers, [19][20][21] phase shifters, [22][23][24] beam splitters, [25][26][27] and broadband mirrors. [28][29][30] Both Mo-on-Si and Si-on-Mo interfaces in MXMs have intermixed interlayers since according to the phase diagram 31 Mo and Si can form chemical compounds.…”