Probing densified silica glass structure by molecular oxygen and E’ point defect formation under irradiation

Abstract

The aim of the paper was to learn more about the structure of densified silica, in particular about the metamict-like silica phase (density = 2.26g/cm3) by examining the radiation-induced formation of E’ point defects and interstitial molecular oxygen. The large amount of the molecular oxygen produced after 11 GGy integrated dose irradiation in the metamict-like phase is destroyed when this one is submitted to electron irradiation. It infers a particular behavior to this silica phase compared to the other densified silica where the amount of O2 is reduced compared to silica. The position and shape of the O2 emission line support the idea that the void configuration of metamict phase is close to silica. A strong correlation exists between the formation of 3-membered rings of Si-O bonds and E’-centers in the densification process between 2.20-and 2.26 density.

Reduction of injection molded silica glass defects and enhancement of glass quality via water debinding

“…Fused silica glass is the most stable glass that possesses unique physicochemical merits, such as high transparency in the ultraviolet (UV)-visible-near infrared (NIR) spectral regions, ultrahigh chemical and thermal stabilities, low thermal expansion and electrical conductivity, and high toughness. [1][2][3][4] These exceptional properties enable pure silica glass to be used in various fields including photonics, biomedicine, and electronics. [5][6][7][8] Despite the fact that fused silica glass products have been commercialized for decades, the fabrication of this glass in different shapes and with high productivity is difficult, costly, and energy inefficient.…”