2006
DOI: 10.1016/s1001-8042(06)60038-9
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Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

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“…Meanwhile, reduction of the Co concentration on the surface showed that the Co atoms diffused into the substrate via the intermediate layer. A similar behavior was also observed in [23]. This means that the required conditions for polycrystalline CoSi phase formation were provided.…”
Section: Resultssupporting
confidence: 79%
“…Meanwhile, reduction of the Co concentration on the surface showed that the Co atoms diffused into the substrate via the intermediate layer. A similar behavior was also observed in [23]. This means that the required conditions for polycrystalline CoSi phase formation were provided.…”
Section: Resultssupporting
confidence: 79%