Probe‐Based 3‐D Nanolithography Using Self‐Amplified Depolymerization Polymers

Knoll, Armin; Pires, David; Coulembier, Olivier; Dubois, Philippe; Hedrick, James L.; Frommer, Jane; Duerig, Urs

doi:10.1002/adma.200904386

Cited by 152 publications

(148 citation statements)

References 27 publications

(28 reference statements)

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“…If the process is purely thermochemical in nature 25 and the resulting patterns are made of a material with structure and chemistry different from the original one, we term the method thermochemical SPL (tc-SPL), also known as thermochemical nanolithography (TCNL). In t-SPL 26,27 either molecular glass resists 4 or the thermally responsive polymer polyphthalaldehyde (PPA) 28 are used as substrate, and they perform exceptionally well for topographic patterning. In PPA the fission of a single bond is amplified by spontaneous decomposition of the remaining polymer chains resulting in a highly efficient patterning process.…”

Section: Thermal and Thermochemical Splmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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Section: Thermal and Thermochemical Splmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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“…The AFM scanning probe technique can be used both as material deposition and removal tool with nano-scale precision and resolution [128]. One particular implementation of scanning nanotip techniques is the thermal scanning probe lithography (t-SPL) [9][10][11]. The technique offers maskless direct writing and is based on decomposition of a resist [Polyphthalaldehyde (PPA)] into volatile monomers upon contact with a hot (~700°C) nano-sharp tip ( Figure 14A).…”

Section: Tip Nano-writingmentioning

confidence: 99%

“…Patterned PPA can be directly used as etch-mask due to its high glass transition temperature T g > 120°C and high mechanical stability [10]. The smallest half-pitch feature of ~18 nm for a pattern transfer into Si for up to 65-nmdeep trenches which only have an edge roughness of 3 nm [130,131].…”

Section: Tip Nano-writingmentioning

confidence: 99%

“…This "optical coating" [8] by deep-UV is expected to advance nanoscale lithographic fabrication. Another emerging nano-lithography technique reviewed here uses a heated atomic force microcopy (AFM) tip [9][10][11]. Its primary advantage is its ability to completely avoid ionization damage to substrates while offering a 10-nm resolution that is on par with conventional electron beam lithography (EBL).…”

Section: Introductionmentioning

confidence: 99%

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Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

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The evolution of optical microscopy from an imaging technique into a tool for materials modification and fabrication is now being repeated with other characterization techniques, including scanning electron microscopy (SEM), focused ion beam (FIB) milling/imaging, and atomic force microscopy (AFM). Fabrication and in situ imaging of materials undergoing a three-dimensional (3D) nano-structuring within a 1−100 nm resolution window is required for future manufacturing of devices. This level of precision is critically in enabling the cross-over between different device platforms (e.g. from electronics to micro-/ nano-fluidics and/or photonics) within future devices that will be interfacing with biological and molecular systems in a 3D fashion. Prospective trends in electron, ion, and nano-tip based fabrication techniques are presented.

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“…Very recent work from Knoll and coworkers have demonstrated the 3D patterning of polymer films with heated AFM probe cantilevers at ~ 40 nm lateral and ~ 1 nm vertical resolution at high speed. [155][156][157] Their most outstanding example is shown in Figure 2.18. This 3D replica of the world map in a custom designed 250 nm thick poly(phthalaldehyde) film was prepared in only 143 seconds and contains 5  10 5 pixels!!…”

Section: Scanning Thermal Lithographymentioning

confidence: 99%

Scanning thermal lithography for nanopatterning of polymers

Duvigneau

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Probe‐Based 3‐D Nanolithography Using Self‐Amplified Depolymerization Polymers

Cited by 152 publications

References 27 publications

Advanced scanning probe lithography

Advanced scanning probe lithography

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

Scanning thermal lithography for nanopatterning of polymers

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