Printable Light-Emitting Metasurfaces with Enhanced Directional Photoluminescence

Abstract

Nanoimprint lithography is gaining popularity as a cost-efficient way to reproduce nanostructures in large quantities. Recent advances in nanoimprinting lithography using high-index nanoparticles have demonstrated replication of photonic devices, but it is difficult to confer special properties on nanostructures beyond general metasurfaces. Here, we introduce a novel method for fabricating light-emitting metasurfaces using nanoimprinting lithography. By utilizing quantum dots embedded in resin, we successfully imprint dielectric metasurfaces that function simultaneously as both emitters and resonators. This approach to incorporating quantum dots into metasurfaces demonstrates an improvement in photoluminescence characteristics compared to the situation where quantum dots and metasurfaces are independently incorporated. Design of the metasurface is specifically tailored to support photonic modes within the emission band of quantum dots with a large enhancement of photoluminescence. This study indicates that nanoimprinting lithography has the capability to construct nanostructures using functionalized nanoparticles and could be used in various fields of nanophotonic applications.

Printable Spin-Multiplexed Metasurfaces for Ultraviolet Holographic Displays

“…Despite being effective, these methods are costly and time-consuming, which impede the broader commercialization and integration of metasurface-based devices for UV applications. To address these challenges, nanoimprint lithography (NIL) has been utilized to enhance scalability and affordability, thus promoting the widespread adoption of metasurfaces across various applications. − However, the typical imprint resins used in NIL display a relatively low refractive index (∼1.5), which requires additional processes such as etching to render them suitable for metasurface applications.…”