Principles and practice of an automatic process control for the deposition of hard nc-TiC/a-C:H coatings by hybrid PVD-PECVD under industrial conditions

Nb-doped TiO2 coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process

“…PVD -CVD hybrid systems can make use of the plasma generated by the magnetron to provide a source of electrons to drive the CVD precursor decomposition and reaction chemistry. Examples of such systems used to deposit functional films include the production of: molybdenum disulfide (MoS2)amorphous hydrogenated carbon (a -C:H) composite coatings 6 , tantalum nitride-based films 7 , hexamethyldisilazane nanocomposites 8 , terbiumdoped silicon oxide films 9 , nanocomposite titanium carbide in an amorphous hydrogenated carbon matrix 10 , diamond-like carbon (DLC) films [11][12][13] and Ti and N codoped DLC 14 .…”