PREVAIL: Theory of the proof of concept column electron optics

Abstract

Articles you may be interested inElectron optics using multipole lenses for a low energy electron beam direct writing system Electron optical image correction subsystem in electron beam projection lithography Lie algebraic aberration theory and calculation method for combined electron beam focusing-deflection systems Electron and ion optical design software for integrated circuit manufacturing equipmentThe PREVAIL proof-of-concept ͑POC͒ system is described elsewhere in these proceedings. For theoretical as well as practical reasons, the operating conditions of POC were restricted to the special, albeit not necessarily optimum case, of the deflected beam following a particular trajectory in the lens doublet forming the backbone of the POC optics; this trajectory is referred to in optics as the ''fundamental off-axis imaging ray.'' To provide guidance for and evaluation of its operation, the necessary computer simulation software was developed in-house. The interaction between modeling and experimentation proved fruitful in achieving the primary objective, demonstration of feasibility of large-area reduction projection and beam scanning for next-generation lithography. Beyond that, the theory provides the means to investigate variations of the optics regarding configuration as well as setup, their impact on performance, and the direction for further improvements.

IPL resistless lithography as a method for delta-doping of monocrystalline semiconductors by Al and Sb implantation

“…In like manner, the objective-aberration error is expanded as (12) the field aberrations being negligible (see Section 2.1). Here, , , and σ dif = are the spot radii due to spherical, chromatic, and diffraction aberration, respectively, the diffraction aberration being treated in the Rayleigh approximation.…”

Nanoimprint lithography: the path toward high-tech, low-cost devices (Keynote Paper)

“…For nanoimprint templates, it was assumed that 10 times fewer shapes would be written as compared to comparable optical masks. Beam size was assumed to be proportional to the beam current to the 5/6 power using the scaling law proposed by Stickel et al 14 Writing the smaller features on the imprint templates requires a smaller beam current to achieve higher resolution for the primary features. Writing throughput was proportional to beam current.…”

Subpixel alignment for scanning-beam lithography using one-dimensional, phase-based mark detection

“…In the first case, the system acquires line scans across a simple mark and determines the edges using a peak search or threshold algorithm. [1][2][3][4] In addition to its intuitive nature and computational simplicitiy, edge detection has the advantages that only two onedimensional ͑1D͒ signals ͑one for the x direction and one for the y direction͒ need be acquired and processed.…”