Pressure Sensing Based on Ratiometric Bragg Grating Loss in a Planar Silica Diaphragm Platform

Jantzen, Alexander; Gow, Paul C.; Gray, Alan C.; Scholl, Senta L.; Gates, James C.; Smith, Peter G. R.; Boyd, Lewis J.; Holmes, Christopher

doi:10.1364/bgppm.2018.jtu2a.62

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2020

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“…Integrated optical waveguides and circuits have a wide range of applications, including; sensing [1][2][3][4], and quantum technologies [5][6][7] to name but a few. These optical devices can be fabricated on a myriad of material platforms, each of which have their own advantages and drawbacks [8].…”

Section: Introductionmentioning

confidence: 99%

213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

et al. 2020

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In this paper we present the first example of waveguides fabricated by UV writing in non-hydrogen loaded Ge-doped planar silica with 213 nm light. Single mode waveguides were fabricated and the numerical apertures and mode field diameters were measured for a range of writing fluences. A peak index change of 5.3 x 10 −3 was inferred for the waveguide written with 70 kJ cm −2. The refractive index change is sufficient to match the index structure of standard optical fiber. Uniformity of the written structures was measured and a propagation loss of 0.39 ± 0.03 dB cm −1 was determined through cutback measurements.

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Section: Introductionmentioning

confidence: 99%

213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

et al. 2020

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Pressure Sensing Based on Ratiometric Bragg Grating Loss in a Planar Silica Diaphragm Platform

Abstract: In this paper the first demonstration of a planar silica-on-silicon chip pressure sensor based on monitoring ratiometric Bragg grating amplitude loss across a diaphragm is made. The device resolution was found to be 0.46 kPa.

Cited by 1 publication

References 2 publications

213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

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