“…In application to these 2D materials, potential pressure-driven tuning of their optoelectronic and other characteristics can open novel portals of their industrial use. For example, earlier theoretical calculations for different forms of TiS 3 , such as monolayers, bilayers, a few-layer-thin films, nanoribbons, and so forth, predicted that uniaxial stresses of different orientations can noticeably alter the band gap values as well as can switch between the indirect and direct types of the band gap. ,,,,, Previous investigations on 2D transition-metal dichalcogenides, such as TX 2 (T = Mo and W and X = S, Se, and Te) having fundamental band gap values of about 1.1–1.4 eV, showed that they turn to metals when subjected to high-pressure application above 40–60 GPa in WSe 2 , − 36–37 GPa in WS 2 , , 30–40 GPa in MoSe 2 , , 19 GPa in MoTe 2 , and above 20–40 GPa in MoS 2 . − These semiconductor–metal transitions either were accompanied by isostructural transformations − ,,, or happened without structural changes. , High-pressure structural investigations on TiS 3 demonstrated that its original ZrSe 3 -type lattice persists under compression up to 22 GPa, and beyond this point, it suffers to an isosymmetric transition . These findings suggest that in the moderate pressure range, which can be realized in various industrial appliances, the crystal structure of these materials is conserved, whereas stress-controlled tuning of their optoelectronic and other properties could be essential and promising for technological use.…”