Preparing of the Chameleon Coating by the Ion Jet Deposition Method

Abstract

Abstract. Preparation of chameleon coatings using an Ionized Jet Deposition (IJD) technique is reported in the present paper. IJD is a new flexible method for thin film deposition developed by Noivion, Srl. The chameleon coatings are thin films characterised by a distinct change of their tribological properties according to the external conditions. The deposited films of SiC and TiN materials were examined by the Raman spectroscopy, SEM and XPS. The results of the Raman spectroscopy have proved an amorphous structure of SiC films. The data from XPS on TiN films have shown that the films are heavily oxidized, but also prove that the films are composed of TiN and pure Ti. The SEM provided information about the size of grains and particles constituting the deposited films, which is important for tribological properties of the films. Deposition of the chameleon coating is very complex problem and IJD could be ideal method for preparation of this coating.

2D-MoS2 goes 3D: transferring optoelectronic properties of 2D MoS2 to a large-area thin film

“…Due to material ablation instead of sputtering, almost any material can be deposited with very efficient material/target use. The IJD method has been successfully used to grow thin films from a wide range of complex materials on various substrates, such as hard metal carbides and nitrides on silicon, aluminium alloy and stainless steel substrates 32 , yttria-stabilized zirconia on SiO 2 , borosilicate, titanium and poly(ether ether ketone) 33 , tin sulfide layers on sodalime glass 34 , soft polymers on stainless steel and glass substrates 35 , and bone apatite-like films on silicon 36,37 . Hence, the IJD technique represents a versatile, very safe, and low-temperature process, which can be explored for TMDC growth, e.g., to obtain stoichiometric and crystalline 2H-MoS 2 without the use of hazardous gases such as hydrogen and sulfur, and carbon compounds, or other molecules (often used as catalysators in the synthesis).…”

Impact of Surface Functionalization by Nanostructured Silver Thin Films on Thermoplastic Central Venous Catheters: Mechanical, Microscopical and Thermal Analyses

“…In such a technique, a high voltage pulsed electron beam (amplitude of up to 25 kV and short period, <1 µs) causes the emission of species from a target surface made of the same material to be deposited (ablation process), with consequent formation of a plasma plume; this latter is addressed towards the substrate surface, where a thin material film is formed atop. Compared to traditional PEA systems, the geometrical configuration used here allows to obtain an increased impact of the electron beam onto the target surface, leading to an increased efficiency of the ablation process and, consequently, a higher deposition rate [28,29]. In the present study, ablation occurred at the surface of a rotating cylindrical 99.99% pure silver target (Ø = 25.4 mm, thickness = 3.18 mm, Kurt J. Lesker Company Ltd., Jefferson Hills, PA, USA) by using an electron beam pulse of duration τ = 100 ns, energy E ≈ V 2 ≈ 10 J and power density P ≈ 10 9 W/cm 2 .…”

The Pulsed Electron Deposition Technique for Biomedical Applications: A Review

“…With respect to PPD, IJD is characterized by a higher efficiency (82%-88%) [22] and leads to a more optimized stoichiometry conservation, turning out to be particularly suitable for: (i) the deposition of superconducting oxides or photoactive semiconductors, (ii) the production of crystalline thin films, and (iii) deposition on any kind of substrate, including thermo-sensitive materials. IJD has been tested for the deposition of SnS thin film layers, useful for photovoltaic applications [23,24]; amorphous chameleon coatings, namely, hard metal carbides and nitrides [25]; and macroscopically homogeneous, adhesive, and cross-linked poly(methylmetacrylate), polystyrene, polyvinylchloride coatings on stainless steel, and glass substrates [26]. As briefly summarized, since its introduction, PED has been exclusively exploited to obtain inorganic and organic coatings for photovoltaic or optoelectronic applications.…”