2022
DOI: 10.1016/j.ceramint.2021.11.115
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Preparation of β-Ga2O3 nanostructured films by thermal oxidation of GaAs substrate

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Cited by 9 publications
(3 citation statements)
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“…Firstly, the preheating stage prepares the wafer for annealing, which ensure homogeneous heating during the heating stage and reduce the crack formation by the As moving to the surface. Complete sublimation is then achieved by heating the samples to 880 • C, above the sublimation temperature of As (>600 • C) [23]. Finally, as the wafer is rich in Ga, oxygen near the surface reacts with it, forming stable Ga 2 O 3 bonds.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Firstly, the preheating stage prepares the wafer for annealing, which ensure homogeneous heating during the heating stage and reduce the crack formation by the As moving to the surface. Complete sublimation is then achieved by heating the samples to 880 • C, above the sublimation temperature of As (>600 • C) [23]. Finally, as the wafer is rich in Ga, oxygen near the surface reacts with it, forming stable Ga 2 O 3 bonds.…”
Section: Methodsmentioning
confidence: 99%
“…Material implementation could be used by exploring techniques such as epitaxial growth and thermal oxidation (TO) of Ga-based wafers to obtain Ga 2 O 3 [21,22]. TO of Ga-based wafers such as gallium nitride and gallium arsenide (GaAs) wafers have been studied to prepare Ga 2 O 3 due to the autogenous supply, which results in the high efficiency of the fabrication process [23].…”
Section: Introductionmentioning
confidence: 99%
“…Nowadays, with the improvement of crystal growth technology, large-scale Ga 2 O 3 single crystals have been produced, such as pulling method, guided mode method, and floating zone melting method [8]. There is also a method of heteroepitaxial growth of gallium oxide thin films on substrates such as quartz glass, sapphire, silicon, and gallium arsenide [9][10][11].…”
Section: Sic Power Diodesmentioning
confidence: 99%