Preparation of Vinylphenols and Isopropenylphenols

Corson, B. B.; Heintzelman, W. J.; Schwartzman, Louis H.; Tiefenthal, H. E.; Lokken, Robert Joseph; Nickels, J. E.; Atwood, G. R.; Pavlik, F. J.

doi:10.1021/jo01098a012

Cited by 96 publications

(29 citation statements)

References 2 publications

(2 reference statements)

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“…Deionized water (Millipore water) was used throughout the work for the emulsion polymerization. 4-Vinylphenol (1 a) was prepared according to the method of Corson et al [8] Block copolymer 2 (PS-b-PEO) was received from Goldschmidt AG, Essen, Germany.…”

Section: Experimental Partmentioning

confidence: 99%

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Koch¹,

Falcou²,

Nenov³

et al. 2001

Macromol. Rapid Commun.

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Section: Experimental Partmentioning

confidence: 99%

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Koch¹,

Falcou²,

Nenov³

et al. 2001

Macromol. Rapid Commun.

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“…67-70°C (ref. [31] 68-69°C) which were identified by comparing their NMR spectra with those published. [35] Reaction of 1-Phenylethane-1,2-diol (6) with DABCO-Purine (Conventional Heating): The reaction conditions were analogous to those of Lembitz et al [19] A mixture of 2-amino-6-chloropurine (5; 0.25 g, 1.48 mmol) and DABCO (0.5 g, 4.45 mmol) was dissolved in 4 mL of DMSO and left standing for 3 h to form a solution of 2-amino-6-(1-azonia-4-azabicyclo[2.2.2]oct-1-yl)purine (9; DABCO-purine).…”

Section: Methodsmentioning

confidence: 99%

“…[30] Arylguanines 22-24 are therefore expected DNA adducts arising from the arene oxi- Vinylphenol (18) is not commercially available and was therefore prepared by alkaline hydrolysis of its acetate. This reaction has been described previously by Corson et al [31] to proceed in aqueous KOH solution. After hydrolysis, the phenolate obtained was acidified with carbon dioxide to liberate phenol 18.…”

Section: -Arylguaninesmentioning

confidence: 99%

Syntheses of O⁶‐Alkyl‐ and Arylguanine Derivatives: Nucleobase Adducts Derived from Styrene 7,8‐ and 3,4‐Oxides

Novák¹,

Hasník

Linhart

2006

Eur J Org Chem

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A series of O6‐alkyl and ‐arylguanine derivatives that may be formed in vivo after exposure to styrene has been prepared by reaction of 6‐(4‐aza‐1‐azoniabicyclo[2.2.2]octyl)‐purine with alkoxides and aryloxides, respectively. Themonoprotected diols 2‐allyloxy‐ or 2‐benzyloxy‐1‐phenylethanol and 2‐allyloxy‐ or 2‐benzyloxy‐2‐phenylethanol were used as synthetic equivalents of styrene 7,8‐oxide. 4‐Vinylphenol, 2‐(4‐hydroxyphenyl)ethanol and 4‐hydroxyphenylacetic acid were used as synthetic equivalents of arene oxide metabolites of styrene, i. e., styrene 3,4‐oxide, 4‐(2‐hydroxyethyl)benzene 1,2‐oxide and 4‐carboxymethylbenzene 1,2‐oxide, respectively. (© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2006)

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“…NMR analysis indicated that polymer compositions were nominally identical to the monomer charge ratio. 4-Acetoxystyrene (96%) was purchased from the Aldrich Chemical Co. p-hydroxystyrene was prepared by hydrolysis of acetoxystyrene, adapting the historic procedure of Corson, et al [13] . Thus, 26.5 g of p-acetoxystyrene doped with 0.025 g of N,N-dimethyl-4-nitrosoaniline was cooled to 0C and diluted with an aqueous solution of 23 g of KOH in 232.5 ml of water.…”

Section: Poly(norbornenyl Hexafluoroalcohol): Pnbhfa Was Donated By Pmentioning

confidence: 99%

Alternatives to chemical amplification for 193nm lithography

et al. 2010

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Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for non-chemically amplified 193 nm photoresists that have the potential to enable improvements in line edge roughness while maintaining adequate sensitivity, base solubility, and dry etch resistance for high volume manufacturing are being explored. The particular platforms that have been explored in this work include dissolution inhibitor photoresist systems, chain scissioning polymers, and photoresist systems based on polymers incorporating formyloxyphenyl functional groups. In studies of two-component acidic polymer/dissolution inhibitor systems, it was found that compositions using ortho-nitrobenzyl cholate (NBC) as the dissolution inhibitor and poly norbornene hexafluoro alcohol (PNBHFA) as the base resin are capable of printing 90 nm dense line/space patterns upon exposure to a 193 nm laser. Studies of chain scission enhancement in methylmethacrylate copolymers showed that incorporating small amounts of absorptive a-cleavage monomers significantly enhanced sensitivity with an acceptable increase in absorbance at 193 nm. Specifically, it was found that adding 3 mol% of α-methyl styrene (α-MS) reduced the dose to clear of PMMA-based resist from 1400 mJ/cm 2 to 420 mJ/cm 2 . Preliminary data are also presented on a direct photoreactive design concept based on the photo-Fries reaction of formyloxyphenyl functional groups in acrylic copolymers.

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Preparation of Vinylphenols and Isopropenylphenols

Cited by 96 publications

References 2 publications

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Syntheses of O⁶‐Alkyl‐ and Arylguanine Derivatives: Nucleobase Adducts Derived from Styrene 7,8‐ and 3,4‐Oxides

Alternatives to chemical amplification for 193nm lithography

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Preparation of Vinylphenols and Isopropenylphenols

Cited by 96 publications

References 2 publications

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Reversibly Crosslinked Networks of Nanoparticles in Metallocene-Catalyzed Olefin Polymerization

Syntheses of O6‐Alkyl‐ and Arylguanine Derivatives: Nucleobase Adducts Derived from Styrene 7,8‐ and 3,4‐Oxides

Alternatives to chemical amplification for 193nm lithography

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Syntheses of O⁶‐Alkyl‐ and Arylguanine Derivatives: Nucleobase Adducts Derived from Styrene 7,8‐ and 3,4‐Oxides