2019
DOI: 10.1016/j.ceramint.2019.07.218
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Preparation of three-dimensional ceramic substrate by multiple electroforming for UV-LED hermetic packaging

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Cited by 14 publications
(7 citation statements)
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“…Nonreactive wetting was realized at a low temperature with no IMCs at this interface. However, in the traditional brazing of ceramic and metal, many IMC layers were produced at the wetting interface via reactive wetting, 10,16 which required a high temperature to realize the decomposition of ceramic.…”
Section: Resultsmentioning
confidence: 99%
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“…Nonreactive wetting was realized at a low temperature with no IMCs at this interface. However, in the traditional brazing of ceramic and metal, many IMC layers were produced at the wetting interface via reactive wetting, 10,16 which required a high temperature to realize the decomposition of ceramic.…”
Section: Resultsmentioning
confidence: 99%
“…Various bonding methods for Cu and ceramic, such as direct bonding copper, 1,7,14,15 direct plating copper, 8,16 active metal bonding, 10,12 and laser activation metallization 9,17 which limits the current carrying capacity. In direct plating copper technology, the ceramic is first surface modified by vacuum sputtering, and then electro-plated Cu is made on the ceramic via chemical bonding at a low temperature of ∼300 • C. 8 The thickness of Cu is limited to below 1 mm for a low plating rate of several µm/h.…”
Section: Introductionmentioning
confidence: 99%
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“…In addition, the voids were inevitable in the Cu layer due to the sintering process, which was also a disadvantage [21]. Besides these methods, the DPC substrates were widely applied as heat dissipation substrate due to theirs high metal pattern precision, excellent thermal performance, and low manufacturing temperature [11,22]. Nevertheless, the Cu layer was easy to delaminated at a relatively high temperature due to the weak bonding strength of van der Waals forces [22].…”
Section: Introductionmentioning
confidence: 99%