Preparation of p-type conductive transparent CuCrO2:Mg thin films by chemical solution deposition with two-step annealing

Thermoelectric and Transport Properties of Delafossite CuCrO2:Mg Thin Films Prepared by RF Magnetron Sputtering

“…This electrical conductivity measured at room temperature increased with the annealing temperature from 450 to 550 °C and reached 0.51 S·cm −1 then decreased slightly for higher annealing temperatures. Similar decrease of the electrical conductivity has already been observed by various authors and attributed to the decrease of copper vacancies and oxygen interstitials at higher temperatures [75,88] or microstructural changes [16]. In the literature, the electrical conductivity of CuCrO 2 :Mg films ranged from 0.033 to 1.6 S·cm −1 [16,78,83,84,89,90].…”

Towards delafossite structure of Cu–Cr–O thin films deposited by reactive magnetron sputtering: Influence of substrate temperature on optoelectronics properties

“…When the annealing temperature increases to 953 K, single delafossite (3R-CuCrO 2 ) phase is formed. The phase structural changes can be explained considering the following reaction [30]:…”

Preparation of CuCrO2 nanowires by electrospinning

“…Based on [3], a forming gas annealing at 400 1C could reduce Cu(II) ion to Cu(I) that effectively suppresses the formation of spinel-structure CuCr 2 O 4 , and allows to form a delafossite CuCrO 2 . The XRD pattern of two-step annealed (T-1) sample is shown in Fig.…”

“…Delafossite-structure CuCrO 2 has attracted much attention as a p-type transparent conductive oxide (TCO), which is of great interest for several applications such as transparent diodes and solar cells [1][2][3]. CuCrO 2 is also one of the most promising candidates for p-type transparent optoelectronic devices.…”

“…Thus, to synthesize CuCrO 2 under a relatively low temperature, an oxygen-free atmosphere such as argon gas is required [3,10].…”