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1983
DOI: 10.1109/tns.1983.4332586
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Preparation of Nuclear Accelerator Targets by Focused Ion Beam Sputter Deposition

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Cited by 12 publications
(3 citation statements)
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“…The deposition of Mo at 1.63 × 10 −2 mbar Ar sputtering gas pressure, keeping the substrate-holder heated at 500 • C in a multilayer deposition mode (more details are presented in a previous work by the authors [3]), gave the best over 100-µm-thick Mo films in terms of adhesion, density (more than 95% of the bulk material), and being stress-free. It should be said that, in the past, a much lower Mo thickness of about 0.1 mg/cm 2 (~0.1 µm calculated for bulk density Mo), obtained using FIB [24] and ultrahigh vacuum sputtering [23], was reported. Our film thickness is comparable to the 130-µm Mo deposited by thermal spray deposition reported by Jalilian et al [22].…”
Section: Sputtering Parameters Optimizationmentioning
confidence: 95%
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“…The deposition of Mo at 1.63 × 10 −2 mbar Ar sputtering gas pressure, keeping the substrate-holder heated at 500 • C in a multilayer deposition mode (more details are presented in a previous work by the authors [3]), gave the best over 100-µm-thick Mo films in terms of adhesion, density (more than 95% of the bulk material), and being stress-free. It should be said that, in the past, a much lower Mo thickness of about 0.1 mg/cm 2 (~0.1 µm calculated for bulk density Mo), obtained using FIB [24] and ultrahigh vacuum sputtering [23], was reported. Our film thickness is comparable to the 130-µm Mo deposited by thermal spray deposition reported by Jalilian et al [22].…”
Section: Sputtering Parameters Optimizationmentioning
confidence: 95%
“…Here, we have associated with the group of physical methods different Physical Vapor Deposition (PVD) methods, such as Focused Ion Beam (FIB) or magnetron sputtering, thermal spray deposition, and plasma spray deposition. Table 1 presents a summary of the most commonly used methods for cyclotron solid target preparation and some examples of their [3,[19][20][21][22][23][24] In order to maximize the nuclear reaction yield, production should be performed at maximum proton currents. This means that the target system should provide high efficiency of heat dissipation.…”
Section: Introductionmentioning
confidence: 99%
“…The PVD methods for direct Mo deposition described in the literature include thermal spray [26], cathodic arc [4], argon [27] and xenon [28] focused ion beam (FIB) sputtering, but no information about cyclotron beam tests of such targets is available. Even if only less than 1-µm-thick Mo coatings by FIB sputtering have been reported, the method still seems interesting because it allows extremely low target material amounts, low losses of expensive isotope-enriched material during deposition, and high purity target material.…”
Section: State-of-the-art: Cyclotron Target For 99mtc Productionmentioning
confidence: 99%