2016
DOI: 10.1007/s11664-016-4404-x
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Preparation of Ca-Si Films on (001) Al2O3 Substrates by an RF Magnetron Sputtering Method and Their Electrical Properties

Abstract: The constituent phases, electrical conductivity, and Seebeck coefficient of Ca-Si films deposited on (001) Al 2 O 3 substrates by a radio frequency magnetron sputtering method using a Mg disk target with Ca and Si chips are investigated. X-ray diffraction analysis indicates that the films consist of a single phase of CaSi 2 , CaSi or Ca 5 Si 3 that are deposited together with the films consisting of a mixture of CaSi 2 and CaSi. Films with a CaSi 2 or CaSi single phase exhibit a metallic behavior. In contrast,… Show more

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Cited by 6 publications
(10 citation statements)
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“…The CaSi 2 films with metastable deformed silicene exhibit ≈3000 times enhancement of S 2 σ (≈40 μW cm −1 K −2 ) from that of reported CaSi 2 film at room temperature (RT). [34] This S 2 σ value is the highest among silicide-based TE films, [35][36][37] higher than that of Bi 2 Te 3 [38] and comparable to the state-of-the-art TE materials (SnSe, [39] Bi 0.5 Sb 1.5 Te 3 , [40] AgPbSbTe, [41] PbTe-SrTe, [42] and SiGeAu [43,44] ). This study demonstrates that S 2 σ is greatly enhanced by the deformation of silicene buckled structure, opening an avenue for realizing eco-friendly TE film.…”
Section: Introductionmentioning
confidence: 77%
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“…The CaSi 2 films with metastable deformed silicene exhibit ≈3000 times enhancement of S 2 σ (≈40 μW cm −1 K −2 ) from that of reported CaSi 2 film at room temperature (RT). [34] This S 2 σ value is the highest among silicide-based TE films, [35][36][37] higher than that of Bi 2 Te 3 [38] and comparable to the state-of-the-art TE materials (SnSe, [39] Bi 0.5 Sb 1.5 Te 3 , [40] AgPbSbTe, [41] PbTe-SrTe, [42] and SiGeAu [43,44] ). This study demonstrates that S 2 σ is greatly enhanced by the deformation of silicene buckled structure, opening an avenue for realizing eco-friendly TE film.…”
Section: Introductionmentioning
confidence: 77%
“…e) S 2 σ of CaSi 2 thin films, the other silicide thin films and bulk, the well‐known rare metal‐based TE thin films, and the state‐of‐the‐art TE bulks at RT. [ 34–44,48 ]…”
Section: Resultsmentioning
confidence: 99%
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