2014
DOI: 10.1007/s00339-014-8276-8
|View full text |Cite
|
Sign up to set email alerts
|

Preparation of Bi:TiO2 thin films by an hybrid deposition configuration: pulsed laser deposition and thermal evaporation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2016
2016
2023
2023

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 10 publications
(4 citation statements)
references
References 10 publications
0
4
0
Order By: Relevance
“…In the last few years, laser ablation has been extensively used to produce a wide variety of materials in thin film form due to its advantages over other deposition techniques due to the intrinsic characteristics of the laser ablation plasma, i. e. species with high kinetic energy and high plasma density [5]. Additionally, the versatility of this technique has allowed the implementation of different variants in order to improve some characteristics of the deposits [6,7]. In this work it is reported the preparation of V 2 O 5 modified with different amounts of silver in which the alternant sequential ablation of two different targets in vacuum is performed in order to control the silver content in the film.…”
Section: Introductionmentioning
confidence: 99%
“…In the last few years, laser ablation has been extensively used to produce a wide variety of materials in thin film form due to its advantages over other deposition techniques due to the intrinsic characteristics of the laser ablation plasma, i. e. species with high kinetic energy and high plasma density [5]. Additionally, the versatility of this technique has allowed the implementation of different variants in order to improve some characteristics of the deposits [6,7]. In this work it is reported the preparation of V 2 O 5 modified with different amounts of silver in which the alternant sequential ablation of two different targets in vacuum is performed in order to control the silver content in the film.…”
Section: Introductionmentioning
confidence: 99%
“…Electron-beam evaporation (EBE) [135][136][137], ion-assisted electron-beam evaporation [138][139][140], pulsed laser deposition (PLD) [31,141], radio frequency (RF) magnetron sputtering [142][143][144][145], direct current (DC) magnetron sputtering [146][147][148], and pulse magnetron sputtering [149,150] are the common PVD methods, which are used to synthesis photocatalysts. Fundamental of PVD process is like CVD, except that in PVD method the raw materials, which are going to be deposited The increase in activity of films is explained in terms of effective vectorial charge separation at the interface of the two oxide semiconductors [113] start in solid form.…”
Section: Pvd Methodsmentioning
confidence: 99%
“…Up to now, different methods have been reported to prepare TiO 2 and TiO 2 -based photocatalyst, including physical vapor deposition (PVD) [30], chemical vapor deposition (CVD) [31], solvothermal [32], hydrothermal [33][34][35], and sol-gel method [34]. Indeed, photocatalytic performance is especially influenced by some factors such as crystallinity, light adsorption ability, pore size, shape, and porosity.…”
Section: Physical Production Techniquesmentioning
confidence: 99%
“…This configuration has been successfully used to prepare TiCN [5], TiAlN [6], and Co:TiO 2 [7] thin films. The use of an alternative configuration in which the film is formed by the interaction of a laser ablation plasma with a flux of atomic vapor has been used to deposit Bi:TiO 2 thin films controlling the amount of Bi into the produced film [8]. In the present work, the preparation of vanadium oxide thin films modified with different amounts of silver using a hybrid deposition configuration is reported.…”
Section: Introductionmentioning
confidence: 97%