2012
DOI: 10.1021/je300764z
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Preparation of Anhydrous Magnesium Chloride: Solid–Liquid Phase Diagram for the System MgCl2–NH3–C2H4[OH]2 at 323 K

Abstract: The ammoniated magnesium chloride hexammoniate compound (HEX) is the key precursor phase required for the production of anhydrous magnesium chloride by the Australian Magnesium (AM) process. It is produced by direct ammoniation of MgCl2-saturated ethylene glycol solutions at 323 K. To determine the conditions required to form HEX, the C2H4[OH]2-rich part of the MgCl2–NH3–C2H4[OH]2 system was investigated at 323 ± 0.5 K. Seven phase regions were determined. These were: NH3(g)+LiqT, HEX+LiqT+NH3(g), HEX+LiqT, HE… Show more

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Cited by 8 publications
(7 citation statements)
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References 8 publications
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“…Finally, by 140 °C for an additional 35 min, strong evidence of the monohydrate was observed. In comparison with the dehydration profiles reported in the literature, the dehydration temperatures under N 2 flow are significantly lower. ,, …”
Section: Results and Disccusionmentioning
confidence: 51%
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“…Finally, by 140 °C for an additional 35 min, strong evidence of the monohydrate was observed. In comparison with the dehydration profiles reported in the literature, the dehydration temperatures under N 2 flow are significantly lower. ,, …”
Section: Results and Disccusionmentioning
confidence: 51%
“…Multiple steps of bischofite (MgCl 2 ·6H 2 O) dehydration at elevated temperatures include , Also, at T = 180 °C partial hydrolysis will occur and generate unwanted MgOHCl: Generation of MgOHCl can be suppressed by dehydrating MgCl 2 ·6H 2 O in an HCl rich environment, but the corrosive action of HCl adds extra capital and operational costs to the process. Indirect methods have been proposed to prevent MgOHCl production, such as using ammonium chloride protections, gas protection heating, and organic solvent distillation. , However, each of these methods has certain disadvantages. In the gas protection heating method and the ammonium chloride protection heating method, MgCl 2 ·6H 2 O is protected by a cover layer of HCl gas and NH 4 Cl vapor, respectively.…”
Section: Introductionmentioning
confidence: 99%
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