1963
DOI: 10.1016/0029-554x(63)90103-4
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Preparation by electro-spraying of thin uranium, plutonium and boron samples for neutron cross section measurements in 4π geometry

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Cited by 39 publications
(10 citation statements)
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“…It is practically important that fabrication of micron-sized dots does not require similarly small holes in a mask. As it was mentioned in early publications on the ESD fabrication of radioactive films, the size of the ES deposited spots can be notably smaller than that of the hole in the dielectric mask. This effect may be called the lens effect.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…It is practically important that fabrication of micron-sized dots does not require similarly small holes in a mask. As it was mentioned in early publications on the ESD fabrication of radioactive films, the size of the ES deposited spots can be notably smaller than that of the hole in the dielectric mask. This effect may be called the lens effect.…”
Section: Resultsmentioning
confidence: 99%
“…In one of them, the mask and the substrate were combined in one unit, which was placed on a rotating table. The capillary tip periodically oscillated to spend equal time over all areas of the rotating substrate as described in ref . As shown in Figure A, a fair uniformity is achieved with this method.…”
Section: Resultsmentioning
confidence: 99%
“…Targets of natural isotopie composition were electroplated on tantalum backings. When targets of enriched isotopes were required and only milligram quantities of material were available, other techniques were used such as molecular plating [3,4], electrospraying [5,6] vacuum deposition from a tungsten microcrucible [7] and the evaporation of small droplets [8], Since the irradiation beam bombarded a portion of the total target area only targets of uniform thickness were accepted. The uniformity of the targets was checked by autoradiography after the samples had been activated.…”
Section: Methodsmentioning
confidence: 99%
“…Electrospray deposition (ESD) is a method to fabricate thin films of micro/nanoparticles directly from solution. ESD was first introduced as a fabrication method of thin radioactive source in nuclear research in 1950s, [16][17][18][19] and was then used in various processes: sample preparation in mass spectrometry, [20,21] modification of silicon surfaces, [22] semi-conductive ceramics, [23] polymer coatings, [24] DNA and protein films for scanning tunnelling microscopy, [25,26] and functionally and biologically active protein deposition. [27][28][29][30] The authors have also studied deposition/patterning methods using electrically charged nanoparticles generated by electrospray [31][32][33] and surface acoustic wave (SAW) atomizer.…”
mentioning
confidence: 99%