Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

Gao, M.H.; Ye, Chao; Wang, Xiangying; He, Yi-Song; Guo, Jia-Min; Yang, Ping

doi:10.1088/1674-1056/25/7/075202

Cited by 4 publications

(6 citation statements)

References 22 publications

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“…Replacing NiO x with a new high mobility hole transporting material such as NiO@Carbon to get highly efficient regular planar heterojunction PSCs at low cost could be a promising route to fabrication via screen printing, doctor blading, and spin coating. [68] Further, the simulated investigations were focused on the effect of electrical conductivity of NiO@Carbon to provide a theoretical guideline in the performance of PSCs. Significantly, enhanced electrical conductivity, high fill factor (FF), and increased short circuit current density (J sc ) are observed in the NiO@carbon based PSCs as depicted in Fig.…”

Section: Resultsmentioning

confidence: 99%

Novel hole transport layer of nickel oxide composite with carbon for high-performance perovskite solar cells

Sajid

Elseman

et al. 2018

Chinese Phys. B

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A depth behavioral understanding for each layer in perovskite solar cells (PSCs) and their interfacial interactions as a whole has been emerged for further enhancement in power conversion efficiency (PCE). Herein, NiO@Carbon was not only simulated as a hole transport layer but also as a counter electrode at the same time in the planar heterojunction based PSCs with the program wxAMPS (analysis of microelectronic and photonic structures)-1D. Simulation results revealed a high dependence of PCE on the effect of band offset between hole transport material (HTM) and perovskite layers. Meanwhile, the valence band offset (∆E v ) of NiO-HTM was optimized to be −0.1 to −0.3 eV lower than that of the perovskite layer. Additionally, a barrier cliff was identified to significantly influence the hole extraction at the HTM/absorber interface. Conversely, the ∆E v between the active material and NiO@Carbon-HTM was derived to be −0.15 to 0.15 eV with an enhanced efficiency from 15% to 16%.

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Section: Resultsmentioning

confidence: 99%

Novel hole transport layer of nickel oxide composite with carbon for high-performance perovskite solar cells

Sajid

Elseman

et al. 2018

Chinese Phys. B

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“…In the experiment, an unbalanced planar magnetron sputtering was used to deposit the Ag thin films, [26][27][28] which was driven by a 60 MHz VHF source in the power range of 50-250 W. In the cylindrical vacuum chamber, the water-cooled circular Ag target (99.999% pure, in diameter of 50 mm) was placed at the top, and the water-cooled, electrically floated stainless steel substrate holder (in diameter of 100 mm) was set at the bottom, about 70 mm away from the target surface. The sputtering target was biased with a VHF voltage of 60 MHz through a corresponding matching box.…”

Section: Methodsmentioning

confidence: 99%

“…[21][22][23][24][25] The previous works showed that the 60 MHz very-high-frequency (VHF) magnetron sputtering had a very low ions flux density and moderate ions energy. [26][27][28][29] If this VHF sputtering is used to deposit the Ag films, the initial growth of Ag films may be exactly controlled. Therefore, in this work, the initial growth and microstructure feature of Ag films prepared by the 60 MHz VHF magnetron sputtering were investigated.…”

Section: Introductionmentioning

confidence: 99%

Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering

Zhang¹,

Ye²,

Wang³

et al. 2017

Chinese Phys. B

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The initial growth and microstructure feature of Ag films formation were investigated, which were prepared by using the very-high-frequency (VHF) (60 MHz) magnetron sputtering. Because of the moderate energy and very low flux density of ions impinging on the substrate, the evolutions of initial growth for Ag films formation were well controlled by varying the sputtering power. It was found that the initial growth of Ag films followed the island (Volmer-Weber, VW) growth mode, but before the island nucleation, the adsorption of Ag nanoparticles and the formation of Ag clusters dominated the growth. Therefore, the whole initial stages of Ag films formation included the adsorption of nanoparticles, the formation of clusters, the nucleation by the nanoparticles and clusters simultaneously, the islands formation, and the coalescence of islands.

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“…Apart from the above methods, recent investigations of the plasma properties of RF and very-high-frequency (VHF) magnetron sputtering have shown that the energy and flux of ions impacting both the target and the substrate could be well adjusted by changing the driving frequency of sputtering [17,18]. Thus, the growth and structural properties of Si, C and Si 1−x C x films could be well controlled [19][20][21]. However, the effect of driving frequency on the growth and structure of Ag films is seldom reported.…”

Section: Introductionmentioning

confidence: 99%

Control of growth and structure of Ag films by the driving frequency of magnetron sputtering

Yang

Wang

et al. 2017

Plasma Sci. Technol.

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The growth and structural properties of Ag films prepared by radio-frequency (2, 13.56 and 27.12 MHz) and very-high-frequency (40.68 and 60 MHz) magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface. Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions' energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.

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Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

Cited by 4 publications

References 22 publications

Novel hole transport layer of nickel oxide composite with carbon for high-performance perovskite solar cells

Novel hole transport layer of nickel oxide composite with carbon for high-performance perovskite solar cells

Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering

Control of growth and structure of Ag films by the driving frequency of magnetron sputtering

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