2003
DOI: 10.1103/physrevb.68.174423
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Preparation and structural characterization of ferromagneticMn5Si3C

Abstract: Si films prepared by magnetron sputtering at elevated substrate temperatures exhibit ferromagnetic order for compositions around Mn 5 Si 3 C x (xϾ0) in contrast to the antiferromagnetic Mn 5 Si 3 compound. In these sputtered samples the carbon concentration can be strongly enhanced compared to sintered powder samples. The local structural order around the Mn site in Mn 5 Si 3 C x films was investigated for xϭ0 and 0.75 by x-ray-absorption spectroscopy at different temperatures T. At low T, both films retain th… Show more

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Cited by 32 publications
(26 citation statements)
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“…This supports our conclusion that the additional contribution to the AHE attributed to a THE in antiferromagnetic Mn 5 Si 3 arises from the non-collinear magnetic structure in the AF1 phase. ð Þ-oriented sapphire substrates (thickness 0.53 mm) at a substrate temperature T S ¼ 470°C and were characterized by X-ray diffraction to confirm formation of the Mn 5 Si 3 -type structure 26,31 . The films have a coarsely grained morphology with an average grain size equal to the film thickness 31 .…”
Section: Discussionmentioning
confidence: 99%
“…This supports our conclusion that the additional contribution to the AHE attributed to a THE in antiferromagnetic Mn 5 Si 3 arises from the non-collinear magnetic structure in the AF1 phase. ð Þ-oriented sapphire substrates (thickness 0.53 mm) at a substrate temperature T S ¼ 470°C and were characterized by X-ray diffraction to confirm formation of the Mn 5 Si 3 -type structure 26,31 . The films have a coarsely grained morphology with an average grain size equal to the film thickness 31 .…”
Section: Discussionmentioning
confidence: 99%
“…3 It was shown 3 that carbon incorporation into the octahedral voids of the hexagonal Mn 5 Ge 3 cell leads to a continuous increase of T C with the doping level in Mn 5 Ge 3 C x and suggests a saturation when all octahedral voids are filled by carbon. A maximum T C of 445 K was obtained for Mn 5 Ge 3 C 0.8 films, obtained by magnetron sputtering. The carbon implanted Mn 5 Ge 3 C 0.8 films were found to exhibit magnetic properties very similar to their sputtered counterparts.…”
mentioning
confidence: 98%
“…Mavropoulos, 2 5 Ge 3 C x films with x Ն 0.5 were experimentally shown to exhibit a strongly enhanced Curie temperature T C compared to Mn 5 Ge 3 . In this letter we present the results of our first principles calculations within Green's function approach, focusing on the effect of carbon doping on the electronic and magnetic properties of the Mn 5 Ge 3 .…”
mentioning
confidence: 99%
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