Preparation and reactivity of aluminum nanopowders coated by hydroxyl-terminated polybutadiene (HTPB)

Guo, Liangui; Song, Wulin; Hu, Mulin; Xie, Changsheng; Chen, Xia

doi:10.1016/j.apsusc.2007.09.043

Cited by 66 publications

(30 citation statements)

References 18 publications

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“…The XRD pattern of deposited material on n-Si substrate placed at 5.0 cm from top of the anode with eight DPF shots recorded with a powder diffractometer using CuKα1 shows a diffraction peak at 2θ=44.8˚ which corresponds to the (200) plane of aluminium [22]. This confirms the presence of Al only.…”

Section: Resultssupporting

confidence: 50%

Deposition of aluminium nanoparticles using dense plasma focus device

Devi¹,

Roy²,

Srivastava³

2010

J. Phys.: Conf. Ser.

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Abstract. Plasma route to nanofabrication has drawn much attention recently. The dense plasma focus (DPF) device is used for depositing aluminium nanoparticles on n-type Si (111) wafer. The plasma chamber is filled with argon gas and evacuated at a pressure of 80 Pa. The substrate is placed at distances 4.0 cm, 5.0 cm and 6.0 cm from the top of the central anode. The aluminium is deposited on Si wafer at room temperature with two focused DPF shots. The deposits on the substrate are examined for their morphological properties using atomic force microscopy (AFM). The AFM images have shown the formation of aluminium nanoparticles. From the AFM images, it is found that the size of aluminium nanoparticles increases with increase in distance between the top of anode and the substrate for same number of DPF shots. IntroductionAluminium is an important material for making contacts in silicon technology for its ability to make both ohmic and Schottky contacts [1]. It is possible to make ohmic contact by making the metal contacts to p-type regions and heavily doped n-type silicon regions and rectifying contact to lightly doped n-type silicon regions. The need for low temperature processing and low resistive material in IC technology has made this simple metal contacts widely used in large scale integration (LSI) and also in early stage of the very large scale integration (VLSI) in recent times. Nanostructures like aluminium silicon nanowire networks have also been fabricated on glass and Si substrates by dealloying an Al-Si thin film through selective chemical etching [2] in order to miniaturize and make power efficient devices. Nanowire can act as electron confinement structure. When it is coupled with appropriate self configuring computer control architecture it would enable realization of self assembled ultrahigh density electronic device. So, metallic contacts of atomic dimensions have been a subject of interest in recent times. Plasma aided nanofabrication [3][4][5][6] has been considered widely for material deposition. Many techniques such as ionized cluster beam (ICB), partially ionized beam (PIB) [7], electron beam evaporation [8], magnetron sputtering [9], pulsed microarc discharge [10] techniques have been employed to deposit aluminium on different substrates. ICB technique has a limitation that the requirement of using a small nozzle of the order of 1-2 mm for supersonic

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Section: Resultssupporting

confidence: 50%

Deposition of aluminium nanoparticles using dense plasma focus device

Devi¹,

Roy²,

Srivastava³

2010

J. Phys.: Conf. Ser.

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“…The formation of nano γ-Al 2 O 3 by slow non-isothermal oxidation (0.5-20.0 K/min) occurs at low temperatures (T = 673-773 K) for electroexplosive nAl [23]. Furthermore, the different definitions of the intense oxidation onset temperature and other parameters on the DTA/DSC/TGA curves can lead to confusing comparisons Copyright © 2017 Institute of Industrial Organic Chemistry, Poland between different datasets [23][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40][41]. For certain nAl samples with a specific surface area 12 m 2 /g, the mass fraction of micron-sized particle clusters (1-3 µm) could be 68 wt.%, but the number of clusters was only 2% of the total number of particles [56].…”

Section: Analysis Of Powder Characteristics and Their Comparison Withmentioning

confidence: 99%

“…The amorphous oxide layers on nAl particles become crystallized at a defined thickness (7-8 nm) during a storage period of 2-3 years at room temperature [26]. However, none of the existing passivation approaches [27][28][29][30] allow nAl particles to reach values of the metallic aluminium content comparable with µAl's metallic content (98-99 wt.%), even assuming large clusters to be present in nAl.…”

Section: Introductionmentioning

confidence: 99%

Nanoaluminium: is there any Relationship between Powder Particles’ Size, Non-Isothermal Oxidation Data and Ballistics?

Gromov¹,

Teipel²

2017

Cent. Eur. J. Energ. Mater.

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This article focuses on data analyses and comparisons for aluminium nanopowders (or nanoaluminium, nAl) reactions under slow (0.5-20.0 K/min, using DTA/DSC/TGA) and fast (>10000 K/min, combustion in solid propellant formulations) non-isothermal oxidation. Particle sizes were defined through the BET method. Active Al content was related with the averaged reactivity parameters, taken from published DTA/DSC/TGA data. The specific oxidation onset temperature for nAl was poorly correlated with the BET particle size under the conditions investigated. Furthermore, the BET particle size exhibited no correlation with the observed ballistic response (burning rate) at 3.0 MPa. A logarithmic correlation y = 17.484 ln(x) -5813, with R² = 0.73, was found between nAl particle size and its aluminium content. A calibration equation for the oxidation onset temperature as a function of nAl particle size was determined as y = −0.0071x 2 + 3.3173x + 479.32, with R² = 0.75. Specific features of the nAl (metallic aluminum content in nAl and the oxidation onset temperature) can be predicted based on the measured powder parameters (such as BET particle size).

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“…Unfortunately, despite the great number of papers published on this subject, as a rule, most results are unrepresentative of the situation. Only a small number of research results are given [10,11] and, in general, these results are not related to the technological scale.…”

Section: Stabilization Of Aluminum Nanopowdersmentioning

confidence: 90%

“…The mechanism of passivation and stabilization of ANPs in different gas and liquid media has been widely discussed [10][11][12][13][14][15]. The thickness, composition and structure of the passivating layer on particles are the main differences between ANPs and micron-sized powders with respect to their oxidation in heterogeneous media, since they define the diffusion rate of a gas oxidizer at low temperatures and, therefore, an ignition temperature and the delay period for the ignition of particles [16].…”

Section: Stabilization Of Aluminum Nanopowdersmentioning

confidence: 99%

Stabilization of Metal Nanoparticles – A Chemical Approach

2009

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The chemical and physical mechanisms for the formation of passivation coatings on active metal nanoparticles were studied in this work. The passivation processes involved in the formation of coatings on nanoparticles were analyzed by SEM, TEM, XRD, EDS, DTA-TG and chemical analysis. Inorganic passivation coatings for aluminum nanopowders were more effective in terms of thermal stability than organic ones. The stability of organic passivation coatings to further oxidation did not depend on the type of coating, but instead depended on the particle size of the passivated powders. A new advanced approach involving a metal nanopowder passivation technique has been applied.

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Preparation and reactivity of aluminum nanopowders coated by hydroxyl-terminated polybutadiene (HTPB)

Cited by 66 publications

References 18 publications

Deposition of aluminium nanoparticles using dense plasma focus device

Deposition of aluminium nanoparticles using dense plasma focus device

Nanoaluminium: is there any Relationship between Powder Particles’ Size, Non-Isothermal Oxidation Data and Ballistics?

Stabilization of Metal Nanoparticles – A Chemical Approach

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