Preparation and properties of ZrO2 and TiO2 films and their nanolaminates by atomic layer deposition

Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature

“…16(b)) is decreasing with increasing T D , confirming the existence of relaxation for the films deposited at lower T D . However, it remains stable for all T D under 0.5, indicating a low density of defects in TiO 2 and is consistent with values for other TiO 2 in the litterature [87][88][89][90]. At 200 • C, tan δ increases from 0.26 @10 2 Hz and 0.45 @8.10 3 Hz and decreases slightly down to 0.37 @10 5 Hz.…”

Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone

“…Gate dielectrics have been a continuous research interest due to their broad applications in nano- and microelectronics [1–3], such as metal oxide films for complementary metal oxide semiconductors (CMOS) [4] and dynamic random access memory (DRAM) [5]. However, the use of the traditional SiO 2 comes to its limit due to the scaling of devices, hence it is urgent to develop next generation of gate dielectrics to replace SiO 2 in semiconductor industry [6, 7]. Recently, alternative metal oxides have been extensively investigated, such as ZrO 2 , Ta 2 O 5 , HfO 2 , Nb 2 O 5, and TiO 2 .…”

Combinatorial ALD for the growth of ZnO/TiO2nanolaminates and mixed ZnO/TiO2nanostructured films

“…8 Noteworthy reviews exist on the topic which explore the fundamentals and importance of these materials [8][9][10] and also with a focus on specific application fields. 11 The applications of hybrid films are almost endless, ranging from use as capacitors, [12][13][14][15] dielectrics and insulators, [16][17][18][19][20][21][22][23][24][25] encapsulation layers/protective coatings, [26][27][28][29][30][31][32][33][34] lubricants 35 and optical waveguides. 36 Specifically, nanolaminates are multicomponent systems consisting of alternating layers of materials such as metals and metal oxides.…”