Preparation and properties of different types of sputtered MoS2 films

On the microstructure of tungsten disulfide films alloyed with carbon and nitrogen

“…The presence at the interface of grains oriented with the (002) plans normal to the substrate has been considered by Bertrand [3] to be due to the reaction of S atoms with the active places of the substrate surface, thereby forcing the perpendicular orientation of the crystallites. Moreover, Buck [21,22] referred that such places could be related to impurity contamination, such as oxygen that is always present in the film growth. If the presence of impurities determines type I growth, their effect is not only restricted to the interface but will extend onto the growth of the entire film, allowing the explanation of the progressive loss of grains with the orientation type II oriented far from the interface.…”

Effects of ion implantation on microstructure, endurance and wear behavior of IBAD MoS2

“…So, it is not surprising that ion irradiation, which can dramatically alter the microstructure of MoS 2 , can also affect its tribological properties. Irradiation of sputter deposited coatings having porous, low density, edge oriented columnar plate morphology and low film-substrate adhesion invariably results in improved coating endurance [7][8][9][10][11][12][13][14][15][16][17][18]; similar experiments have been described for WS 2 [19]. However, careful studies by Mikkelsen and Sørensen [20] have demonstrated that while ion irradiation both densified and increased the endurance of poor (porous, edge-oriented) MoS 2 coatings, the same treatment applied to better performing sputtered coatings (with dense, nearly amorphous microstructures) resulted in decreased endurance at high dosages.…”

“…Microstructure is reported to be a controlling factor in the friction and endurance of MoS 2 coatings [1][2][3][4][5][6]. So, it is not surprising that ion irradiation, which can dramatically alter the microstructure of MoS 2 , can also affect its tribological properties.…”

Growth mechanisms and near-interface structure in relation to orientation of MoS2 sputtered thin films

“…The most promising explanation, proposed by Buck, relates to the water partial pressure during deposition. 5 " 7 Recently, a more complex situation has been described: the morphology results from the succession of both orientations during the growth of the film. 11 The aim of this paper is to provide a precise structural description of the interfacial region.…”