2014
DOI: 10.4028/www.scientific.net/amr.970.124
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Preparation and Mechanical Characterization of Amorphous B-C Films

Abstract: This study has demonstrated that trimethylboron, B(CH3)3 is a suitable boron source material for the fabrication amorphous boron carbide (a-BC:H) films. a-BC:H films were deposited by pluse plasma chemical vapor deposition on a silicon substrate (100) with different gas pressures and gas flow rates at constant voltage, -5 kV . The grown a-BC:H films were found to be porous surface and their thickness were in the range of 0.95 to 1.56 μm for 3 h of deposition time. Results indicated that the boron contents, mor… Show more

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Cited by 1 publication
(4 citation statements)
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“…Under 20 000 sliding cycles, the friction coefficient of a -BC:H film is low ( μ : 0.2); this result is consistent with our previous findings in sliding tests of a -BC:H films coated on (100) silicon substrate without any interlayer [16], where the friction coefficient was also 0.2. At low cycles (<20 000), the loose rounded coarse particles or debris are present on the sliding contact of a -BC:H worn surface film, which attach to the steel counter face, creating a transfer layer resulting in the low COF.…”
Section: Resultssupporting
confidence: 91%
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“…Under 20 000 sliding cycles, the friction coefficient of a -BC:H film is low ( μ : 0.2); this result is consistent with our previous findings in sliding tests of a -BC:H films coated on (100) silicon substrate without any interlayer [16], where the friction coefficient was also 0.2. At low cycles (<20 000), the loose rounded coarse particles or debris are present on the sliding contact of a -BC:H worn surface film, which attach to the steel counter face, creating a transfer layer resulting in the low COF.…”
Section: Resultssupporting
confidence: 91%
“…The pore formation on the film surface may be attributed to the oxidation process, which generally occurs during the deposition or post deposition [16, 21, 27]. The black surface area is identified as porous area on the film surface.…”
Section: Resultsmentioning
confidence: 99%
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