2000
DOI: 10.1016/s0304-8853(99)00753-2
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Preparation and characterization of thin ferromagnetic CrO2 films for applications in magnetoelectronics

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Cited by 40 publications
(22 citation statements)
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“…But the Rietveld analysis of XRD patterns and the XPS findings rule out any secondary phase formation in our samples, nevertheless, the unidentified traces of various chromium oxides are unlikely sources of ferromagnetism due to the following facts: the bulk Cr 2 O 3 is anti-ferromagnetic insulator with T N ∼ 307 K [31]. The CrO 2 metallic and ferromagnetic, however, it has a T C ∼ 391 K [32]. The ␣-Cr 2 O 5 Fig.…”
Section: Discussionmentioning
confidence: 85%
“…But the Rietveld analysis of XRD patterns and the XPS findings rule out any secondary phase formation in our samples, nevertheless, the unidentified traces of various chromium oxides are unlikely sources of ferromagnetism due to the following facts: the bulk Cr 2 O 3 is anti-ferromagnetic insulator with T N ∼ 307 K [31]. The CrO 2 metallic and ferromagnetic, however, it has a T C ∼ 391 K [32]. The ␣-Cr 2 O 5 Fig.…”
Section: Discussionmentioning
confidence: 85%
“…Both, CrO and TiO have a rutile structure but the lattice mismatch between the film and the substrate has been noted to be significant causing an anisotropic in-plane tensile strain in the film. The structural and magnetic properties of these films have been extensively characterized [3]- [5]. An important property of the epitaxial grown CrO (100) thin films is the very large in-plane uniaxial anisotropy, with well-defined magnetic easy and hard axis along the [001] ( -axis) and [010], ( -axis), respectively, that is reflected in the magnetic measurements [4], [7].…”
Section: Methodsmentioning
confidence: 99%
“…Pulsed laser deposition of CrO 2 is hardly reported -only one work to our knowledge [4]. Lately, CrO 2 thin films have been prepared by chemical vapour deposition (CVD) or molecular beam epitaxy (MBE) [5] starting from CrO 3 . Ivanov et al [6] have obtained their best CrO2 film by CVD from Cr 8 O 21 .…”
Section: Introductionmentioning
confidence: 99%