Preparation and characterization of plasma-polymerized thiophene films

Bhat, N. V.; Wavhal, Dattatray S.

doi:10.1002/(sici)1097-4628(19981003)70:1<203::aid-app20>3.0.co;2-6

Cited by 51 publications

(21 citation statements)

References 7 publications

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“…After doping with iodine, conductivities ranging from 10 -6 to 10 -4 S/cm were obtained. Bhat et al 15 also reported that plasma polymerization of thiophene was carried out in a tubular reactor using an RF source and that the electrical conductivity was found to be very low (10 -10 S/ cm) before doping. Silverstein et al 20 have also reported the molecular structure and electrical properties of plasma polymerized thiophene.…”

supporting

confidence: 84%

“…Similar results have been observed from plasma-polymerized thiophene film deposited on glass and aluminum plates by N.V. Bhat et al. 15 They have reported that the films deposited for 10 min showed a globular size ranging from 1 to 1.2 μm whereas those deposited for 45 min revealed variation from 8 to 10.2 μm. In addition, the numbers of globules observed were higher.…”

Section: Resultsmentioning

confidence: 99%

“…Plasma polymerization has been used to synthesize conducting polymer films from pyrrole and thiophene derivatives. [11][12][13][14][15][16][17][18][19] Especially, Sadhir et al 14 reported the plasma polymerized thiophene layer using Ar gas. After doping with iodine, conductivities ranging from 10 -6 to 10 -4 S/cm were obtained.…”

mentioning

confidence: 99%

“…[14][15][16] However, the conductivity level of the resulting film was low and application of in-situ doping was very difficult. In this paper, we report the formation of plasma-polymerized conductive PT films doped by in-situ plasma doping technique.…”

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Deposition andin-situ plasma doping of plasma-polymerized thiophene films using PECVD

et al. 2009

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Highly transparent, thin polythiophene (PT) films were successfully synthesized by the plasma polymerization of thiophene. These films were doped with O 2 plasma by in-situ doping technique. The plasma polymerized PT films were deposited at about 50 to 340 nm/min, depending on the temperature and plasma power. A resultant transparency as high as 85% was achieved. The plasma polymerized PT films exhibited the characteristics of an insulator or semiconductor (10 1 0 ~ 1 2 Ω/̱ , 10 -7S/cm). The conductivity was immediately increased up to 10 Ω/̱ and 10 -2 S/cm, when doped with O 2 plasma. The plasma-doped PT films exhibited an increased surface roughness resulting in a decreased contact angle. However, the thickness of the PT layer was partially decomposed and/or etched with increasing voltage above 40 W.

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confidence: 84%

Section: Resultsmentioning

confidence: 99%

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Deposition andin-situ plasma doping of plasma-polymerized thiophene films using PECVD

et al. 2009

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“…If the substrate is conductive, this problem can be solved by using electropolymerization with deposition directly on the substrate. Nevertheless, both chemical and electrochemical synthesis, are Plasma polymerizations of thiophene and derivatives at low pressure have already been reported [11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] . However, since this technique requires a high vacuum, it can only be done in a batch process.…”

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confidence: 99%

Plasma Deposition of Thiophene Derivatives Under Atmospheric Pressure

Dams

Vangeneugden

Vanderzande

2006

Chemical Vapor Deposition

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Plasma deposition of conjugated polymer films at atmospheric pressure is described. The thiophene derivatives, thiophene, 3-methylthiophene and 3,4-ethylenedioxythiophene were used as monomers. The plasma depositions with the different precursors were compared with analytical techniques such as XPS, FT-IR, UV-VIS and resistance measurements.Good results were obtained with pulsed plasma depositions of poly (3,4-ethylenedioxythiophene). Conductivities up to 1 x 10 -2 S/cm were measured.

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Plasma Technology, Nanoengineering of Advanced Materials

Manolache¹,

Şaşmazel²,

Uygun³

et al. 2012

Kirk-Othmer Encyclopedia of Chemical Technology

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In the last century Langmuir started the investigation of plasma. Since then scientists have been investigating the great energetic potential of plasma chemistry for chemical transformations, macromolecular depositions and surface modification of materials, especially polymers. Recently, nanoscale investigations in various scientific fields point out the importance of nanostructures (nanoparticles, nanopatterns, nanotopographies, nanocomposites) for advanced material properties and for extending these properties (eg, mechanical, electrical, hydrophilicity, hydrophobicity, etc.) beyond typical material properties. Plasmas have unique properties due to high energetic level combined with presence of very active species: radicals, ions and electrons; complex chemical mechanisms can develop to deposit macromolecular layers or to produce nanostructures on various surfaces for advanced material properties beyond bulk properties of polymers. Cold plasma as source for charged particles was used to induce nanotopographies on homopolymeric surfaces and for surface nanoengineering of polymers using vacuum operated or atmospheric pressure non‐equilibrium barrier discharge reactors. SEM and AFM analyses reveal the presence of nanotopographies on the treated surfaces. Physical factors control the process below the glass‐transition temperature, T g and chemical factors dominate the process above T g . Charges are tools that open‐up new ways for nanoengineering of the polymers' surfaces with specific functionalities / topography. Future nanomanufacturing techniques can generate anti‐scratch, superhydrophobic or superhydrophilic properties on surface of everyday use polymeric products by simple and convenient plasma enhanced processes.

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Preparation and characterization of plasma-polymerized thiophene films

Cited by 51 publications

References 7 publications

Deposition andin-situ plasma doping of plasma-polymerized thiophene films using PECVD

Deposition andin-situ plasma doping of plasma-polymerized thiophene films using PECVD

Plasma Deposition of Thiophene Derivatives Under Atmospheric Pressure

Plasma Technology, Nanoengineering of Advanced Materials

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