Preparation and characterization of molecular photoresists: Crosslinkable positive and water developable negative tones

Abstract

The development of a water-developable negative photoresist from b-CD using an acid-catalyzed chemical amplification method is investigated here. Tertiary butoxyl protected b-cyclodextrin (t-BOC-CD) is also synthesized and used to prepare a positive photoresist. Glutaraldehyde is added as a crosslinking agent for both positive and negative photoresists. Deprotection of t-BOC-CD is accelerated by a photo-induced acid. In the presence of glutaraldehyde and acid, both the deprotected t-BOC-CD and b-cyclodextrin are crosslinked. The introduction of a t-butoxyl group into the b-CD molecule and the addition of glutaraldehyde into the b-CD molecules are both found to decrease the crystallinity of the molecules, improving the resist film properties. The etching resistance of both positive and negative photoresist films is improved by the crosslinking method.

Process Optimization of Single-Step Photolithography

“…Using the wafer we obtained above, we developed the wafer again to increase the total developing time from 50s to 120s. According to the research data collected by previous researcher in figure 6, developer will dissolve more exposed positive photoresist and the thickness should decrease as we increased the development time [6]. However, our result showed an over-developed pattern (peel off) (Figure 7).…”

Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials

“…[1][2][3][4][5][6][7][8] Saccharides have been proposed as a water-soluble resist material with low environmental load, but it cannot be said that the low environmental load is sufficient because the coating is performed using an organic solvent. [9] In addition, a plant-derived and water-soluble sugar (dextrin) photoresist material that can be coated and developed with water has been studied, but the coating strength is low due to the low molecular weight. As a result, the film strength after UV curing is low.…”

Effect of Sugar Chain Binding Mode on Water-soluble Micropatterning Performance and Physical Characteristics

“…[1][2][3][4][5][6][7][8] A material containing saccharides has been proposed as an alternative water-soluble resist material, but the total environmental load of the process is still substantial because the coating is performed using an organic solvent. [9] In addition, water-soluble photoresist materials that can be coated and developed with water and are composed of plant-derived and water-soluble sugars (dextrin) have shown promise, but only 1,4-and 1,6-bonds have been studied. An evaluation of only the main general dextrin system was performed, and the effect of the binding mode is still unknown.…”