2012
DOI: 10.1007/s11665-012-0133-3
|View full text |Cite
|
Sign up to set email alerts
|

Preparation and Characterization of Ir Coating on WC Ceramic by Double Glow Plasma

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 9 publications
(2 citation statements)
references
References 27 publications
0
2
0
Order By: Relevance
“…Physical vapor deposition (PVD) methods, including double-discharge plasma deposition [21], magnetron sputtering in radio-frequency discharge [3,22], and direct-current discharge [23] are used for deposition of Ir coatings most widely to date. For stable operation of deposition facility in a double-discharge plasma, it is necessary to set a relatively high negative potential not only of the sputtered Ir cathode (typical values are 800-900 V) but also of the substrates (300-400 V) [21,24].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Physical vapor deposition (PVD) methods, including double-discharge plasma deposition [21], magnetron sputtering in radio-frequency discharge [3,22], and direct-current discharge [23] are used for deposition of Ir coatings most widely to date. For stable operation of deposition facility in a double-discharge plasma, it is necessary to set a relatively high negative potential not only of the sputtered Ir cathode (typical values are 800-900 V) but also of the substrates (300-400 V) [21,24].…”
Section: Introductionmentioning
confidence: 99%
“…Physical vapor deposition (PVD) methods, including double-discharge plasma deposition [21], magnetron sputtering in radio-frequency discharge [3,22], and direct-current discharge [23] are used for deposition of Ir coatings most widely to date. For stable operation of deposition facility in a double-discharge plasma, it is necessary to set a relatively high negative potential not only of the sputtered Ir cathode (typical values are 800-900 V) but also of the substrates (300-400 V) [21,24]. The energy of ions bombarding the coating in such devices is usually determined by the conditions of stable discharge combustion, and the value of the ion current density directly depends on other operating parameters (electrode potentials, gas pressure).…”
Section: Introductionmentioning
confidence: 99%