Preliminary Results of 1.5 kJ Mather-Type Plasma Focus with Stainless Steel Anode

Abstract

A new low energy (1.5 kJ) Mather-type dense plasma focus, called Sahand University of Technology Dense Plasma Focus (SUT-DPF) device has been designed, constructed and operated. The paper reports on the preliminary results with argon as filling gas. A Rogowski coil has been used to measure the experimental discharge current. The current signal contains a set of data from physical processes in the device as well as discharge current characteristics. The device circuit parameters were calculated using the short-circuit test. In a typical discharge experiment, these values were obtained: the discharge period was 15.4 ± 0.1 ls, the discharge current 100.8 ± 0.7 kA, the total inductance of the device 197 ± 3 nH and electrical resistance of circuit 11.3 ± 1 mX. The Rogowski coil sensitivity was obtained 49.65 ± 0.3 kA/V. A resistive voltage divider was also used to measure the transient voltage across the plasma. The experimental results showed that the pinch time at a constant pressure of the argon gas, decreased by increasing the charging voltage. The optimum pressure for 5, 6.5 and 7.5 kV obtained 0.75, 1 and 1.5 mbar, respectively.

Experimental study of the effect of circuit inductance on pinch-time in plasma focus MTPF2.5 KJ .

“…Plasma behavior in the plasma focus device was studied experimentally. Temporal changes in plasma focus discharge current confirmed pinch occurrence at a specific pressure and voltage of argon as filling gas by E. Ghareshabani [6]. But so far, not enough experimental research has been done to investigate the effect of total circuit inductance on pinch time.…”

Electrochemical behaviour of NiTi alloy coated with TiN using DPF

“…During discharge, the nitrogen atoms react with titanium element sputtered from the titanium anode and form nucleate of TiNs that are re-deposited on the NiTi substrate and comprised a nitride layer. 14,15 …”

“…Changing the surface topography and increasing surface roughness and wettability of the surface are attractive features of plasma which lead to biocompatibility and bioactivity of implants. 14,15 It is worthwhile to note that this method is applied for the first time on the NiTi substrate.…”