Preferential vaporization and plasma shielding during nano-second laser ablation

Mao, Xianglei; Chan, Wing-Shing; Caetano, Manuel; Shannon, Mark A.; Russo, Richard E.

doi:10.1016/0169-4332(95)00420-3

Cited by 78 publications

(26 citation statements)

References 17 publications

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“…It has been reported that plasma shielding is mainly caused by inverse Bremsstrahlung process in a plasma plume. [10][11][12] From fitting line II, the etching rate at the energy density of 1.0 J/cm 2 was determined to be 91 nm/pulse. The measurement of optical emission from Cd atoms allows us to control the laser energy density and detect interfaces such as CdTe/GaAs.…”

Section: Resultsmentioning

confidence: 99%

Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe

Abe

Eryu

Nakashima

et al. 2005

Journal of Elec Materi

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Optical emission and surface compositional change during the laser-etching process of CdTe are reported. The etching rate increases in proportion to the laser energy density. However, the increase in etching rate is suppressed because ablation plasma plumes generated by the laser irradiation at the energy densities above 0.4 J/cm 2 shield the laser beam. The etching rate at the energy density of 1.0 J/cm 2 has been determined to be 91 nm/pulse. Also, 80-µm-deep and 55-µm-wide trenches have been formed with the laser-etching process.

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Section: Resultsmentioning

confidence: 99%

Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe

Abe

Eryu

Nakashima

et al. 2005

Journal of Elec Materi

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show abstract

“…Mao et al, 16 Aguilera et al 17 and Aragon et al 18 reported that the experimental conditions which can affect the analytical performance need to be optimized carefully for meaningful quantitative results from the linear calibration curve. Based on the purpose for which LIBS is to be used, one needs to make a judicious choice of the spectrograph, detectors and collection/excitation optics.…”

Section: Introductionmentioning

confidence: 99%

“…[11][12][13][14] Many groups around the globe are working on LIBS quantitative elemental analysis using calibration curve method. [15][16][17][18][19][20] For this, generally, a calibration curve prepared by using the emission line intensity of the analyte material versus its concentration is used. The curves are constructed using known standard elemental concentrations in a matrix matching the sample.…”

Section: Introductionmentioning

confidence: 99%

Homogeneity testing and quantitative analysis of manganese (Mn) in vitrified Mn-doped glasses by laser-induced breakdown spectroscopy (LIBS)

et al. 2014

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Laser-induced breakdown spectroscopy (LIBS), an atomic emission spectroscopy method, has rapidly grown as one of the best elemental analysis techniques over the past two decades. Homogeneity testing and quantitative analysis of manganese (Mn) in manganese-doped glasses have been carried out using an optimized LIBS system employing a nanosecond ultraviolet Nd:YAG laser as the source of excitation. The glass samples have been prepared using conventional vitrification methods. The laser pulse irradiance on the surface of the glass samples placed in air at atmospheric pressure was about 1.7×109 W/cm2. The spatially integrated plasma emission was collected and imaged on to the spectrograph slit using an optical-fiber-based collection system. Homogeneity was checked by recording LIBS spectra from different sites on the sample surface and analyzing the elemental emission intensities for concentration determination. Validation of the observed LIBS results was done by comparison with scanning electron microscope- energy dispersive X-ray spectroscopy (SEM-EDX) surface elemental mapping. The analytical performance of the LIBS system has been evaluated through the correlation of the LIBS determined concentrations of Mn with its certified values. The results are found to be in very good agreement with the certified concentrations.

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“…Model outcomes were also compared with experiments performed on a vast variety of target materials [10][11][12]. Due to extreme process complexity, most models treat either target-material changes or plasma properties and propagation; some models however address both aspects [4,6].…”

Section: Introductionmentioning

confidence: 99%

Model and computer simulation of nanosecond laser material ablation

2004

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Preferential vaporization and plasma shielding during nano-second laser ablation

Cited by 78 publications

References 17 publications

Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe

Optical emission characteristics of ablation plasma plumes during the laser-etching process of CdTe

Homogeneity testing and quantitative analysis of manganese (Mn) in vitrified Mn-doped glasses by laser-induced breakdown spectroscopy (LIBS)

Model and computer simulation of nanosecond laser material ablation

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